F7360 Surface physics

Faculty of Science
Autumn 2002
Extent and Intensity
2/0/0. 2 credit(s). Type of Completion: k (colloquium).
Teacher(s)
doc. Mgr. Lenka Zajíčková, Ph.D. (lecturer)
doc. RNDr. Ladislav Sodomka, CSc. (lecturer)
Guaranteed by
prof. RNDr. Jan Janča, DrSc.
Department of Plasma Physics and Technology – Physics Section – Faculty of Science
Contact Person: doc. RNDr. Ladislav Sodomka, CSc.
Course Enrolment Limitations
The course is also offered to the students of the fields other than those the course is directly associated with.
fields of study / plans the course is directly associated with
Course objectives
It is the purpose of this lecture to give an overview about the physical methods used for surface and thin film characterisations. The lecture is divided into three parts. In the introduction the various types of materials are summarised from the standpoint of their structure, the preparation of clean surfaces and basic aspects of interactions between photons, electrons, ions, neutral particles and materials are explained. The second part of the lecture concentrates on the processes and methods of electron spectroscopies (XPS, UPS, AES, EELS, FES, APS). In the third part the attention is paid to the principles and methods utilizing ion beams (RBS, ERDA, NRA etc.).
Syllabus
  • 1. Introduction: atom bonding; types of materials (ceramics, glasses, metals and alloys, polymers, composite materials) and their microstructure; definition and structure of surfaces; work function and surface states; methods of obtaining clean surfaces; interactions between photons, electrons, ions, neutral particles and materials (surface demages, penetration depth, resolution) 2. Electron spectroscopy: thermal emission; photoemission; autoemission; processes caused by electron impact; techniques and equipment of electron spectroscopies; photoelectron spectroscopy (UPS, XPS); spectroscopy utilizing electron impact (AES, EELS); field emission spectroscopy (FES); appearence potential spectroscopy (APS) 3. Ion beam analysis: processes caused by ion beam impact (ion scattering, channeling, sputtering); techniques and equipment of ion beam analysis; ion scattering spectroscopy (RBS, ERDA, LEIS); nuclear reaction analysis (NRA), ion induced X-ray emission (PIXE); secondary ion mass spectrometry (SIMS)
Literature
  • FLEWITT, P. E. J. and R. K. WILD. Physical methods for materials characterisation. Bristol1: IOP, 1994. ISBN 0 7503 0320 4. info
  • ECKERTOVÁ, L. Metody analýzy povrchu - elektronová spektroskopie (Methods for surface analysis - electron spectroscopy). Praha: Akademia, 1990. ISBN 80-200-0261-8. info
  • BIRD, J. R. and J. S. WILLIAMS. Ion beam for materials analysis. Sydney: Academic Press, 1989. ISBN 0 12 099740 1. info
Language of instruction
Czech
Further Comments
The course can also be completed outside the examination period.
The course is taught annually.
The course is taught: every week.
The course is also listed under the following terms Autumn 1999, Spring 2008 - for the purpose of the accreditation, Autumn 2000, Spring 2002, Autumn 2003, Spring 2005, Spring 2006, Spring 2007, Spring 2008, Spring 2009, Spring 2010, Spring 2012, spring 2012 - acreditation, Spring 2014, Spring 2016, spring 2018, Spring 2020, Spring 2022, Spring 2024.
  • Enrolment Statistics (Autumn 2002, recent)
  • Permalink: https://is.muni.cz/course/sci/autumn2002/F7360