FB100 Plasma chemical processes

Faculty of Science
Autumn 2012
Extent and Intensity
2/0. 2 credit(s). Type of Completion: z (credit).
Teacher(s)
prof. RNDr. Mirko Černák, CSc. (lecturer)
prof. RNDr. Jan Janča, DrSc. (lecturer)
Guaranteed by
prof. RNDr. Jan Janča, DrSc.
Department of Plasma Physics and Technology – Physics Section – Faculty of Science
Contact Person: prof. RNDr. Jan Janča, DrSc.
Supplier department: Department of Plasma Physics and Technology – Physics Section – Faculty of Science
Timetable
Tue 15:00–16:50 Fs2 6/4003
Prerequisites
F5170 Plasma physics && F7241 Plasma physics 1
F5170 Plasma Physics
Course Enrolment Limitations
The course is offered to students of any study field.
Course objectives
The goal of this subject is an understanding of selected topics from plasma chemistry with special attention to the techniques important in iindustry.
The main items are as follows:
Rate of plasma chemical reaction.
Different kinds of plasma chemical reactions.
Homogeneous and heterogeneous plasma chemical reactions.
Plasma chemical reactors.
Power supply and matching networks of plasma chemical reactors.
Plasma surface treatment of solid materials.
Plasma polymerization.
Deposition of thin films.
Plasma sputtering and plasma spraying.
Deposition of hard and supra hard coatings.
Mebranes and semipermeable thin films.
Plasma ashing and plasma etching.
Plasma chemical processes in semiconductor industry.
Plasma in modern lighting techniques.
Plasma metallurgy.
Syllabus
  • Rate of plasma chemical reaction.
  • Different kinds of plasma chemical reactions.
  • Homogeneous and heterogeneous plasma chemical reactions.
  • Plasma chemical reactors.
  • Power supply and matching networks of plasma chemical reactors.
  • Plasma surface treatment of solid materials.
  • Plasma polymerization.
  • Deposition of thin films.
  • Plasma sputtering and plasma spraying.
  • Deposition of hard and supra hard coatings.
  • Mebranes and semipermeable thin films.
  • Plasma ashing and plasma etching.
  • Plasma chemical processes in semiconductor industry.
  • Plasma in modern lighting techniques.
  • Plasma metallurgy.
Literature
  • FRIDMAN, Aleksandr Arkad'jevič. Plasma chemistry. 1st pub. Cambridge: Cambridge University Press, 2008, xlii, 978. ISBN 9781107684935. info
  • SMIRNOV, Boris Michajlovič. Plasma processes and plasma kinetics : 586 worked out problems for science and technology. Weinheim: WILEY-VCH Verlag GmbH & Co. KGaA, 2007, ix, 572. ISBN 9783527406814. info
  • FRIDMAN, Aleksandr Arkad'jevič and Lawrence A. KENNEDY. Plasma physics and engineering. New York: Taylor & Francis, 2004, 853 s. ISBN 1560328487. info
  • Techniques and applications of plasma chemistry. Edited by John R. Hollahan - Alexis T. Bell. New York: John Wiley & Sons, 1974, viii, 403. ISBN 0471406287. info
  • MCTAGGART, Frederick Kenneth. Plasma chemistry in electrical discharges. Amsterdam: Elsevier Publishing Company, 1967, xi, 246. info
Teaching methods
Theoretical oral lecture summarizing advanced appliedplasma chemical processes.
Assessment methods
Lectures. Colloquium with written test.
Language of instruction
English
Further comments (probably available only in Czech)
Information on completion of the course: Způsob ukončení je dán individuálním studijním plánem
The course can also be completed outside the examination period.
The course is taught annually.
The course is also listed under the following terms Autumn 2007 - for the purpose of the accreditation, Autumn 1999, Autumn 2010 - only for the accreditation, Autumn 2000, Autumn 2001, Autumn 2002, Autumn 2003, Autumn 2004, Autumn 2005, Autumn 2006, Autumn 2007, Autumn 2008, Autumn 2009, Autumn 2010, Autumn 2011, Autumn 2011 - acreditation, spring 2012 - acreditation, Autumn 2013, Autumn 2014, Autumn 2015, Autumn 2016, autumn 2017, Autumn 2018, Autumn 2019, Autumn 2020, autumn 2021, Autumn 2022, Autumn 2023, Autumn 2024.
  • Enrolment Statistics (Autumn 2012, recent)
  • Permalink: https://is.muni.cz/course/sci/autumn2012/FB100