The course is also offered to the students of the fields other than those the course is directly associated with.
Fields of study the course is directly associated with
there are 14 fields of study the course is directly associated with, display
The course should provide the basic overview of all important methods used to deposit new materials in form of thin films and about methods to modify the surfaces. The student gets awared about principles and technologies of vacuum evaporation, sputtering methods, etching and surface modification as well as chemical vapour deposition or plasma enhanced chemical vapour deposition. Additionaly some of the processes will be shown in real work.
Overview of thin film deposition procedures
Chemical vapour depositon
Plasma enhanced chemical vapour depositon
Physical vapour deposition
Reactive magnetron sputtering
D. Depla et al Reactive sputter depositon, Springer Series in Material Science 109 2008
The course is based on lectures that provide a detailed overview of the subject. The block of two laboratory exercises is organized at the end of semester. In the frame of this laboratories the students will train two methods of thin film deposition, plasma enhanced chemical vapor deposition and magnetron sputtering.