Analysis of thin films with slightly rough boundaries

@article{200406,
   author = {Ohlídal, Ivan and Franta, Daniel and Hora, Jaroslav and Navrátil, Karel and Weber, Jan and Janda, Pavel},
   article_location = {Wien},
   article_number = {1},
   keywords = {Spectroscopic Ellipsometry; Spectroscopic Reflectometry; Atomic Force Microscopy},
   language = {eng},
   issn = {0026-3672},
   journal = {Mikrochim. Acta},
   title = {Analysis of thin films with slightly rough boundaries},
   url = {http://hydra.physics.muni.cz/~franta/bib/MA15_177.html},
   volume = {Suppl. 15},
   year = {1998}
}

TY  - JOUR
ID  - 200406
AU  - Ohlídal, Ivan - Franta, Daniel - Hora, Jaroslav - Navrátil, Karel - Weber, Jan - Janda, Pavel
PY  - 1998
TI  - Analysis of thin films with slightly rough boundaries
JF  - Mikrochim. Acta
VL  - Suppl. 15
IS  - 1
SP  - 177
EP  - 177
PB  - Springer-Verlag
SN  - 00263672
KW  - Spectroscopic Ellipsometry
KW  - Spectroscopic Reflectometry
KW  - Atomic Force Microscopy
UR  - http://hydra.physics.muni.cz/~franta/bib/MA15_177.html
N2  - In this paper presented method is based on a combination of variable angle spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy enabling us to determine the optical parameters and most significant statistical parameters of the rough boundaries characterizing the slightly rough single layers.
ER  - 

OHLÍDAL, Ivan, Daniel FRANTA, Jaroslav HORA, Karel NAVRÁTIL, Jan WEBER a Pavel JANDA. Analysis of thin films with slightly rough boundaries. \textit{Mikrochim. Acta}. Wien: Springer-Verlag, Suppl. 15, č.~1, s.~177-180. ISSN~0026-3672. 1998.