STANGL, J., Václav HOLÝ, A.A. DARHUBER, Petr MIKULÍK, G. BAUER, J. ZHU, K. BRUNNER a G. ABSTREITER. High-resolution x-ray diffraction on self-organized step bunches of Si1-xGex grown on (113)-oriented Si. J. Phys. D: Appl. Phys. Velká Britanie: IOP Publishing LTd, 1999, roč. 32, č. 9999, s. A71, 4 s. ISSN 0022-3727. |
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@article{205370, author = {Stangl, J. and Holý, Václav and Darhuber, A.A. and Mikulík, Petr and Bauer, G. and Zhu, J. and Brunner, K. and Abstreiter, G.}, article_location = {Velká Britanie}, article_number = {9999}, language = {eng}, issn = {0022-3727}, journal = {J. Phys. D: Appl. Phys.}, title = {High-resolution x-ray diffraction on self-organized step bunches of Si1-xGex grown on (113)-oriented Si}, volume = {32}, year = {1999} }
TY - JOUR ID - 205370 AU - Stangl, J. - Holý, Václav - Darhuber, A.A. - Mikulík, Petr - Bauer, G. - Zhu, J. - Brunner, K. - Abstreiter, G. PY - 1999 TI - High-resolution x-ray diffraction on self-organized step bunches of Si1-xGex grown on (113)-oriented Si JF - J. Phys. D: Appl. Phys. VL - 32 IS - 9999 SP - A71 EP - A71 PB - IOP Publishing LTd SN - 00223727 N2 - We present investigations of a highly regular terraced surface and interface structure of Si/SiGe multilayers on Si(113) by x-ray diffraction, x-ray reflectivity and atomic force microscopy. A regular array of step bunches with lateral periods of several hundred nanometres is formed during the growth of the Si/Si1-xGex multilayers. X-ray diffraction patterns are simulated using the elastic Green function approach for the evaluation of the strain fields associated with the step edges, taking into account the relaxation towards the free surface. In addition to the terrace structure, a surface waviness on the micrometer length scale is present, leading to a modulation of the terrace widths. ER -
STANGL, J., Václav HOLÝ, A.A. DARHUBER, Petr MIKULÍK, G. BAUER, J. ZHU, K. BRUNNER a G. ABSTREITER. High-resolution x-ray diffraction on self-organized step bunches of Si$<$sub$>$1-x$<$/sub$>$Ge$<$sub$>$x$<$/sub$>$ grown on (113)-oriented Si. \textit{J. Phys. D: Appl. Phys.}. Velká Britanie: IOP Publishing LTd, 1999, roč.~32, č.~9999, s.~A71, 4 s. ISSN~0022-3727.
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