X-ray reflectivity of self-assembled structures in SiGe multilayers and comparison with atomic ...

@article{385315,
   author = {Meduňa, Mojmír and Holý, Václav and Roch, T.},
   article_location = {USA},
   article_number = {9},
   keywords = {SI(001) SURFACES; GE ISLANDS; SCATTERING; GROWTH; SUPERLATTICES},
   language = {eng},
   issn = {0021-8979},
   journal = {Journal of Applied Physics},
   title = {X-ray reflectivity of self-assembled structures in SiGe multilayers and comparison with atomic force microscopy},
   volume = {89},
   year = {2001}
}

TY  - JOUR
ID  - 385315
AU  - Meduňa, Mojmír - Holý, Václav - Roch, T.
PY  - 2001
TI  - X-ray reflectivity of self-assembled structures in SiGe multilayers and comparison with atomic force microscopy
JF  - Journal of Applied Physics
VL  - 89
IS  - 9
SP  - 4836
EP  - 4836
PB  - American institute of physics
SN  - 00218979
KW  - SI(001) SURFACES
KW  - GE ISLANDS
KW  - SCATTERING
KW  - GROWTH
KW  - SUPERLATTICES
N2  - We have studied the interface morphology of SiGe/Si multilayers by means of specular and nonspecular x-ray reflectivity under grazing incidence. The samples were grown by molecular beam epitaxy on silicon substrates with (001) surface orientation and with different directions of the surface misorientation. X-ray reflectivity measurements in different azimuths are compared to data from atomic force microscopy, which are used to simulate the x-ray experiments. With this combination of experimental techniques we have determined the structural properties, in particular the ordering of different features present at the sample surface and inside the multilayer at the SiGe/Si layer interfaces.
ER  - 

MEDUŇA, Mojmír, Václav HOLÝ a T. ROCH. X-ray reflectivity of self-assembled structures in SiGe multilayers and comparison with atomic force microscopy. \textit{Journal of Applied Physics}. USA: American institute of physics, 2001, roč.~89, č.~9, s.~4836-4842. ISSN~0021-8979.