OHLÍDAL, Ivan, Daniel FRANTA, Miloslav OHLÍDAL and Karel NAVRÁTIL. Determination of Thicknesses and Spectral Dependences of Refractive Indices of Non-Absorbing and Weakly Absorbing Thin Films Using the Wavelengths Related to Extrema in Spectral Reflectances. Vacuum. USA: ELSEVIER (PERGAMON), 2001, vol. 61, No 1, p. 285-289. ISSN 0042-207X.
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Basic information
Original name Determination of Thicknesses and Spectral Dependences of Refractive Indices of Non-Absorbing and Weakly Absorbing Thin Films Using the Wavelengths Related to Extrema in Spectral Reflectances
Authors OHLÍDAL, Ivan (203 Czech Republic, guarantor), Daniel FRANTA (203 Czech Republic), Miloslav OHLÍDAL and Karel NAVRÁTIL (203 Czech Republic).
Edition Vacuum, USA, ELSEVIER (PERGAMON), 2001, 0042-207X.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10306 Optics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 0.541
RIV identification code RIV/00216224:14310/01:00004312
Organization unit Faculty of Science
UT WoS 000168796500035
Keywords in English Thin films; Spectral reflectance; Optical parameters
Tags Optical parameters, Spectral reflectance, thin films
Changed by Changed by: Mgr. Daniel Franta, Ph.D., učo 2000. Changed: 25/12/2003 00:21.
Abstract
In this contribution a new efficient modification of the method enabling us to perform the optical characterization of non-absorbing and weakly absorbing thin films without using the absolute values of the reflectances measured will be presented. Namely, this modification is based on determining the values of the wavelengths corresponding to the points of touching the spectral dependences of the reflectances of the studied films measured for several angles of incidence with the envelopes of maxima and minima of these spectral dependences. By means of combining the explicit formulae containing the wavelengths mentioned and the suitable iteration procedure one can evaluate the values of the thicknesses and spectral dependences of the refractive indices of the films analyzed in both reliable and precise ways. This fact will be demonstrated through the optical characterization of non-absorbing films of silicon dioxide and weakly absorbing films of photoresist placed on silicon single crystal substrates. The results of this characterization will be compared with those achieved using a combined method of variable angle of incidence spectroscopic ellipsometry and near normal incidence spectroscopic reflectometry.
Links
GA202/98/0988, research and development projectName: Charakterizace vrstevnatých systémů s náhodně drsnými rozhraními pomocí optických a rtg metod
Investor: Czech Science Foundation, Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods
GV106/96/K245, research and development projectName: Tvrdé a supertvrdé povlaky vytvořené nekonvenčními plazmovými procesy
Investor: Czech Science Foundation, Hard and superhard coatings prepared by unconventional plasma processes
VS96084, research and development projectName: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze
Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague
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