F8500 Advanced methods laboratory 2

Faculty of Science
Spring 2016
Extent and Intensity
1/2. 3 credit(s). Type of Completion: z (credit).
doc. RNDr. Vilma Buršíková, Ph.D. (seminar tutor)
prof. Mgr. Vít Kudrle, Ph.D. (seminar tutor)
doc. RNDr. Jozef Ráheľ, PhD. (seminar tutor)
doc. Mgr. Pavel Sťahel, Ph.D. (seminar tutor)
prof. Mgr. Petr Vašina, Ph.D. (seminar tutor)
Guaranteed by
prof. RNDr. Mirko Černák, CSc.
Department of Plasma Physics and Technology – Physics Section – Faculty of Science
Course Enrolment Limitations
The course is also offered to the students of the fields other than those the course is directly associated with.
fields of study / plans the course is directly associated with
Course objectives
Get knowledge regarding methods of surface treatment.
  • 1. surface activation in dielectric coplanar barrier discharge
  • 2. thin film deposition in OBV at atmospheric pressure
  • 3. thin film deposition in a capacitively coupled high frequency discharge
  • 4. surface activation in microwave dischrges
  • 5. thin film deposition by means of plasma jet
  • 6. magnetron deposition of thin films
Teaching methods
Laboratory with an indroducing lecture
Assessment methods
Language of instruction
Further Comments
The course is taught annually.
The course is taught: every week.
The course is also listed under the following terms Spring 2013, Spring 2014, Spring 2015, Spring 2017, spring 2018, Spring 2019.
  • Enrolment Statistics (Spring 2016, recent)
  • Permalink: https://is.muni.cz/course/sci/spring2016/F8500