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@inproceedings{1094560,
author = {Falub, C.V. and Isa, F. and Kreiliger, T. and Bergamaschini, R. and Marzegalli, A. and Taboada, A.G. and Chrastina, D. and Isella, G. and Müller, E. and Niedermann, P. and Dommann, A. and Neels, A. and Pezous, A. and Meduňa, Mojmír and Miglio, L. and von Känel, Hans},
address = {Berkeley, CA},
booktitle = {2012 International Silicon-Germanium Technology and Device Meeting, ISTDM 2012 - Proceedings},
doi = {http://dx.doi.org/10.1109/ISTDM.2012.6222457},
editor = {Tsu Jae King Liu},
keywords = {silicon; heteroepitaxy; x-ray diffraction},
howpublished = {tištěná verze "print"},
language = {eng},
location = {Berkeley, CA},
isbn = {978-1-4577-1862-5},
pages = {60-61},
publisher = {EEE eXpress Conference Publishing},
title = {Space-filling arrays of three-dimensional epitaxial Ge and Si1-xGex crystals},
year = {2012}
}
TY - JOUR
ID - 1094560
AU - Falub, C.V. - Isa, F. - Kreiliger, T. - Bergamaschini, R. - Marzegalli, A. - Taboada, A.G. - Chrastina, D. - Isella, G. - Müller, E. - Niedermann, P. - Dommann, A. - Neels, A. - Pezous, A. - Meduňa, Mojmír - Miglio, L. - von Känel, Hans
PY - 2012
TI - Space-filling arrays of three-dimensional epitaxial Ge and Si1-xGex crystals
PB - EEE eXpress Conference Publishing
CY - Berkeley, CA
SN - 9781457718625
KW - silicon
KW - heteroepitaxy
KW - x-ray diffraction
N2 - The crystalline quality, tilt and strain of the Ge and Si1-xGex crystals were investigated by high resolution X-ray diffraction.
ER -
FALUB, C.V., F. ISA, T. KREILIGER, R. BERGAMASCHINI, A. MARZEGALLI, A.G. TABOADA, D. CHRASTINA, G. ISELLA, E. MÜLLER, P. NIEDERMANN, A. DOMMANN, A. NEELS, A. PEZOUS, Mojmír MEDUŇA, L. MIGLIO a Hans VON KÄNEL. Space-filling arrays of three-dimensional epitaxial Ge and Si1-xGex crystals. In Tsu Jae King Liu. \textit{2012 International Silicon-Germanium Technology and Device Meeting, ISTDM 2012 - Proceedings}. Berkeley, CA: EEE eXpress Conference Publishing. s.~60-61. ISBN~978-1-4577-1862-5. doi:10.1109/ISTDM.2012.6222457. 2012.
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