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@article{1094597,
author = {Krumpolec, Richard and Zahoranová, Anna and Černák, Mirko and Kováčik, Dušan},
article_location = {Praha},
article_number = {S},
keywords = {plasma polymerization; hexamethyldisiloxane; glass; hydrophobic surface},
language = {eng},
issn = {0009-2770},
journal = {CHEMICKÉ LISTY},
title = {CHEMICAL AND PHYSICAL EVALUATION OF HYDROPHOBIC pp-HMDSO LAYERS DEPOSITED BY PLASMA POLYMERIZATION AT ATMOSPHERIC PRESSURE},
volume = {106},
year = {2012}
}
TY - JOUR
ID - 1094597
AU - Krumpolec, Richard - Zahoranová, Anna - Černák, Mirko - Kováčik, Dušan
PY - 2012
TI - CHEMICAL AND PHYSICAL EVALUATION OF HYDROPHOBIC pp-HMDSO LAYERS DEPOSITED BY PLASMA POLYMERIZATION AT ATMOSPHERIC PRESSURE
JF - CHEMICKÉ LISTY
VL - 106
IS - S
SP - 1450-1454
EP - 1450-1454
PB - Česká společnost chemická
SN - 00092770
KW - plasma polymerization
KW - hexamethyldisiloxane
KW - glass
KW - hydrophobic surface
N2 - This work deals with plasma polymerization deposition of hydrophobic layers onto glass substrates at atmospheric pressure. The hexamethyldisiloxane (HMDSO)organosilicon monomer was used as precursor for plasma polymerization in nitrogen working gas. The so-called Diffuse Coplanar Surface Barrier Discharge was used as a source of non-equilibrium non-thermal plasma. The pp-HMDSO thin films were studied by the means of SEM,AFM, FTIR, XPS and SIMS measurements. Our research revealed that smooth, polymer-like, hydrophobic and transparent in visible range thin films were deposited on the glass substrates. The results indicate that DCSBD discharge can be used for thin films deposition by the means of plasma polymerization process at atmospheric pressure.
ER -
KRUMPOLEC, Richard, Anna ZAHORANOVÁ, Mirko ČERNÁK a Dušan KOVÁČIK. CHEMICAL AND PHYSICAL EVALUATION OF HYDROPHOBIC pp-HMDSO LAYERS DEPOSITED BY PLASMA POLYMERIZATION AT ATMOSPHERIC PRESSURE. \textit{CHEMICKÉ LISTY}. Praha: Česká společnost chemická, roč.~106, S, s.~1450-1454. ISSN~0009-2770. 2012.
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