MEDVECKÁ, Veronika, Anna ZAHORANOVÁ, Dušan KOVÁČIK and Ján GREGUŠ. THE EFFECT OF SURFACE CLEANING AND REMOVING OF ORGANIC CONTAMINANTS FROM SILICON SUBSTRATES AND ITO GLASS BY ATMOSPHERIC PRESSURE NON-THERMAL PLASMA. CHEMICKÉ LISTY. Praha: Česká společnost chemická, 2012, vol. 106, S, p. 1455-1459. ISSN 0009-2770.
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Basic information
Original name THE EFFECT OF SURFACE CLEANING AND REMOVING OF ORGANIC CONTAMINANTS FROM SILICON SUBSTRATES AND ITO GLASS BY ATMOSPHERIC PRESSURE NON-THERMAL PLASMA
Authors MEDVECKÁ, Veronika (703 Slovakia, guarantor), Anna ZAHORANOVÁ (703 Slovakia), Dušan KOVÁČIK (703 Slovakia, belonging to the institution) and Ján GREGUŠ (703 Slovakia).
Edition CHEMICKÉ LISTY, Praha, Česká společnost chemická, 2012, 0009-2770.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 0.453
RIV identification code RIV/00216224:14310/12:00064658
Organization unit Faculty of Science
UT WoS 000324813100009
Keywords in English DCSBD; silicon substrates; ITO glass;cleaning; organic contaminants
Tags AKR, rivok
Changed by Changed by: Mgr. Dana Skácelová, Ph.D., učo 106528. Changed: 4/4/2013 11:04.
Abstract
Plasma generated by DCSBD was investigated for cleaning and removing of organic contaminants from semiconductor materials. ITO glass used in photovoltaics and three types of most often used silicon surfaces in semiconductor industry – precleaned silicon, thermally oxidized silicon and H-terminated silicon was studied. The changes in chemical bonds on silicon surfaces were investigated by FTIR. Removing of IPA from silicon substrates was observed by XPS measurements. Effectivity of DCSBD as cleaning agent in comparison with isopropylacohol was investigated on ITO glass samples by XPS measurement.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
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