HNILICA, Jaroslav, Jan SCHÄFER, Rüdiger FOEST, Lenka ZAJÍČKOVÁ and Vít KUDRLE. PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure. J. Phys. D: Appl. Phys. 2013, vol. 46, No 33, p. nestránkováno, 8 pp. ISSN 0022-3727. Available from: https://dx.doi.org/10.1088/0022-3727/46/33/335202. |
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@article{1118531, author = {Hnilica, Jaroslav and Schäfer, Jan and Foest, Rüdiger and Zajíčková, Lenka and Kudrle, Vít}, article_number = {33}, doi = {http://dx.doi.org/10.1088/0022-3727/46/33/335202}, keywords = {PECVD; modulated; microwave; plasma jet; atmospheric pressure}, language = {eng}, issn = {0022-3727}, journal = {J. Phys. D: Appl. Phys.}, title = {PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure}, url = {http://iopscience.iop.org/0022-3727/46/33/335202/}, volume = {46}, year = {2013} }
TY - JOUR ID - 1118531 AU - Hnilica, Jaroslav - Schäfer, Jan - Foest, Rüdiger - Zajíčková, Lenka - Kudrle, Vít PY - 2013 TI - PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure JF - J. Phys. D: Appl. Phys. VL - 46 IS - 33 SP - nestránkováno EP - nestránkováno SN - 00223727 KW - PECVD KW - modulated KW - microwave KW - plasma jet KW - atmospheric pressure UR - http://iopscience.iop.org/0022-3727/46/33/335202/ N2 - We performed the thin films deposition using atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) by means of a microwave plasma jet operating with mixtures of argon and tetrakis(trimethylsilyloxy)silane (TTMS). ER -
HNILICA, Jaroslav, Jan SCHÄFER, Rüdiger FOEST, Lenka ZAJÍČKOVÁ and Vít KUDRLE. PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure. \textit{J. Phys. D: Appl. Phys.}. 2013, vol.~46, No~33, p.~nestránkováno, 8 pp. ISSN~0022-3727. Available from: https://dx.doi.org/10.1088/0022-3727/46/33/335202.
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