Detailed Information on Publication Record
2013
PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure
HNILICA, Jaroslav, Jan SCHÄFER, Rüdiger FOEST, Lenka ZAJÍČKOVÁ, Vít KUDRLE et. al.Basic information
Original name
PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure
Authors
HNILICA, Jaroslav (203 Czech Republic, belonging to the institution), Jan SCHÄFER (203 Czech Republic), Rüdiger FOEST (276 Germany), Lenka ZAJÍČKOVÁ (203 Czech Republic, belonging to the institution) and Vít KUDRLE (203 Czech Republic, guarantor, belonging to the institution)
Edition
J. Phys. D: Appl. Phys. 2013, 0022-3727
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10305 Fluids and plasma physics
Country of publisher
United Kingdom of Great Britain and Northern Ireland
Confidentiality degree
není předmětem státního či obchodního tajemství
References:
Impact factor
Impact factor: 2.521
RIV identification code
RIV/00216224:14310/13:00068976
Organization unit
Faculty of Science
UT WoS
000322784200010
Keywords in English
PECVD; modulated; microwave; plasma jet; atmospheric pressure
Tags
International impact, Reviewed
Změněno: 14/7/2015 10:14, Olga Křížová
Abstract
V originále
We performed the thin films deposition using atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) by means of a microwave plasma jet operating with mixtures of argon and tetrakis(trimethylsilyloxy)silane (TTMS).
Links
| ED1.1.00/02.0068, research and development project |
| ||
| ED2.1.00/03.0086, research and development project |
| ||
| 7AMB12DE005, research and development project |
|