| SPIRK, Stefan, Heike M EHMANN, Rupert KARGL, Natascha HURKES, Martin REISCHL, Jiří NOVÁK, Roland RESEL, Ming WU, Rudolf PIETSCHNIG and Volker RIBITSCH. Surface Modifications Using a Water-Stable Silanetriol in Neutral Aqueous Media. ACS APPLIED MATERIALS & INTERFACES. WASHINGTON: AMER CHEMICAL SOC, 2010, vol. 2, No 10, p. 2956-2962. ISSN 1944-8244. Available from: https://dx.doi.org/10.1021/am100644r. |
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@article{1123333,
author = {Spirk, Stefan and Ehmann, Heike M and Kargl, Rupert and Hurkes, Natascha and Reischl, Martin and Novák, Jiří and Resel, Roland and Wu, Ming and Pietschnig, Rudolf and Ribitsch, Volker},
article_location = {WASHINGTON},
article_number = {10},
doi = {http://dx.doi.org/10.1021/am100644r},
keywords = {silanetriol; surface modification; contact angle; zeta potential; x-ray reflectivity},
language = {eng},
issn = {1944-8244},
journal = {ACS APPLIED MATERIALS & INTERFACES},
title = {Surface Modifications Using a Water-Stable Silanetriol in Neutral Aqueous Media},
volume = {2},
year = {2010}
}
TY - JOUR
ID - 1123333
AU - Spirk, Stefan - Ehmann, Heike M - Kargl, Rupert - Hurkes, Natascha - Reischl, Martin - Novák, Jiří - Resel, Roland - Wu, Ming - Pietschnig, Rudolf - Ribitsch, Volker
PY - 2010
TI - Surface Modifications Using a Water-Stable Silanetriol in Neutral Aqueous Media
JF - ACS APPLIED MATERIALS & INTERFACES
VL - 2
IS - 10
SP - 2956-2962
EP - 2956-2962
PB - AMER CHEMICAL SOC
SN - 19448244
KW - silanetriol
KW - surface modification
KW - contact angle
KW - zeta potential
KW - x-ray reflectivity
ER -
SPIRK, Stefan, Heike M EHMANN, Rupert KARGL, Natascha HURKES, Martin REISCHL, Jiří NOVÁK, Roland RESEL, Ming WU, Rudolf PIETSCHNIG and Volker RIBITSCH. Surface Modifications Using a Water-Stable Silanetriol in Neutral Aqueous Media. \textit{ACS APPLIED MATERIALS \&{}amp; INTERFACES}. WASHINGTON: AMER CHEMICAL SOC, 2010, vol.~2, No~10, p.~2956-2962. ISSN~1944-8244. Available from: https://dx.doi.org/10.1021/am100644r.
|
