| NEUHOLD, A, Jiří NOVÁK, H G FLESCH, Armin MOSER, T DJURIC, L GRODD, S GRIGORIAN, U PIETSCH and R RESEL. X-ray radiation damage of organic semiconductor thin films during grazing incidence diffraction experiments. AMSTERDAM: ELSEVIER SCIENCE BV, 2012, vol. 284, p. 64-68. Available from: https://dx.doi.org/10.1016/j.nimb.2011.07.105. |
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@article{1123346,
author = {Neuhold, A and Novák, Jiří and Flesch, H G and Moser, Armin and Djuric, T and Grodd, L and Grigorian, S and Pietsch, U and Resel, R},
article_location = {AMSTERDAM},
doi = {http://dx.doi.org/10.1016/j.nimb.2011.07.105},
keywords = {Radiation damage; Organic semiconductor; Grazing incidence X-ray diffraction; Fluence},
language = {eng},
title = {X-ray radiation damage of organic semiconductor thin films during grazing incidence diffraction experiments},
volume = {284},
year = {2012}
}
TY - JOUR
ID - 1123346
AU - Neuhold, A - Novák, Jiří - Flesch, H G - Moser, Armin - Djuric, T - Grodd, L - Grigorian, S - Pietsch, U - Resel, R
PY - 2012
TI - X-ray radiation damage of organic semiconductor thin films during grazing incidence diffraction experiments
VL - 284
SP - 64-68
EP - 64-68
PB - ELSEVIER SCIENCE BV
KW - Radiation damage
KW - Organic semiconductor
KW - Grazing incidence X-ray diffraction
KW - Fluence
ER -
NEUHOLD, A, Jiří NOVÁK, H G FLESCH, Armin MOSER, T DJURIC, L GRODD, S GRIGORIAN, U PIETSCH and R RESEL. X-ray radiation damage of organic semiconductor thin films during grazing incidence diffraction experiments. AMSTERDAM: ELSEVIER SCIENCE BV, 2012, vol.~284, p.~64-68. Available from: https://dx.doi.org/10.1016/j.nimb.2011.07.105.
|
