CAHA, Ondřej, P. KOSTELNÍK, Jan ŠIK, Y.D. KIM and Josef HUMLÍČEK. Lattice constants and optical response of pseudomorph Si-rich SiGe:B. Applied Physics Letters. USA: American institute of physics, 2013, vol. 103, No 20, p. "nestránkováno", 4 pp. ISSN 0003-6951. Available from: https://dx.doi.org/10.1063/1.4830367.
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Basic information
Original name Lattice constants and optical response of pseudomorph Si-rich SiGe:B
Name in Czech Mřížkové parametry a optická odezva pseudomorfní slitiny SiGe:B
Authors CAHA, Ondřej (203 Czech Republic, belonging to the institution), P. KOSTELNÍK (203 Czech Republic), Jan ŠIK (203 Czech Republic, belonging to the institution), Y.D. KIM (410 Republic of Korea) and Josef HUMLÍČEK (203 Czech Republic, guarantor, belonging to the institution).
Edition Applied Physics Letters, USA, American institute of physics, 2013, 0003-6951.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10302 Condensed matter physics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 3.515
RIV identification code RIV/00216224:14740/13:00065531
Organization unit Central European Institute of Technology
Doi http://dx.doi.org/10.1063/1.4830367
UT WoS 000327818700048
Keywords in English silicon; SiGe alloys; heavy doping
Tags rivok
Tags International impact, Reviewed
Changed by Changed by: prof. RNDr. Josef Humlíček, CSc., učo 307. Changed: 8/2/2018 09:38.
Abstract
Pseudomorph epitaxial films of Si1-xGex:B were grown on undoped (100) Si for x<0.026 and the B concentration of 1.3E20 cm-3. The in-plane and out-of-plane lattice constants were determined using the X-ray techniques for 004 symmetric and 224 asymmetric diffraction. The influence of B and Ge co-doping has been detected in reflectance and ellipsometric spectra from infrared to ultraviolet. Free-hole plasma and Fano-type resonances of Si phonons and localized 11B and 10B vibrations have been observed. The spectral shift of E1 electronic transitions has been quantified. We found a simple way to test the variations of Ge content using relative reflectance spectra.
Abstract (in Czech)
Pseudomorní epitaxní vrstvy Si1-xGex:B byly připraveny na nedopovaném (100) Si pro x<0.026 a koncentraci B 1.3E20 cm-3. Mřížkové konstanty v rovině vrstvy a kolmo na ni byly určeny pomocí symetrické rtg difrakce 004 a asymetrické difrakce 224. Vliv dopingu B a Ge byl detekován v reflexních a elipsometrických spektrech v oblasti IR-UV. Byla pozorována odezva plasmatu volných děr a Fanova rezonance fononů Si a lokalizovaných vibrací 11B a 10B. Spektrální posuv přechodů E1 byl kvantifikován. Našli jsme jednoduchou možnost testu změn obsahu Ge užitím spekter relativní reflektance.
Links
MUNI/A/1047/2009, interní kód MUName: Struktura, elektronová struktura a optická odezva pokročilých materiálů
Investor: Masaryk University, Category A
TA01010078, research and development projectName: Struktury SOI pro pokročilé polovodičové aplikace (Acronym: ONSEMI)
Investor: Technology Agency of the Czech Republic
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