J 2013

Growth, Structure, and Electronic Properties of Epitaxial Bismuth Telluride Topological Insulator Films on BaF2 (111) Substrates

CAHA, Ondřej, Adam DUBROKA, Josef HUMLÍČEK, Václav HOLÝ, Hubert STEINER et. al.

Basic information

Original name

Growth, Structure, and Electronic Properties of Epitaxial Bismuth Telluride Topological Insulator Films on BaF2 (111) Substrates

Name in Czech

Růst, strukturní a elektronové vlastnosti epitaxních vrstvy topologického izolátoru bismut teluridu deponované na BaF2 substrátech

Authors

CAHA, Ondřej (203 Czech Republic, guarantor, belonging to the institution), Adam DUBROKA (203 Czech Republic, belonging to the institution), Josef HUMLÍČEK (203 Czech Republic, belonging to the institution), Václav HOLÝ (203 Czech Republic), Hubert STEINER (40 Austria), M. UL-HASSAN (40 Austria), Jaime SANCHEZ-BARRIGA (724 Spain), Oliver RADER (276 Germany), T. N. STANISLAVCHUK (840 United States of America), Andrei A. SIRENKO (840 United States of America), Günther BAUER (40 Austria) and Günter SPRINGHOLZ (40 Austria)

Edition

Crystal Growth & Design, Washington, American Chemical Society, 2013, 1528-7483

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10302 Condensed matter physics

Country of publisher

United States of America

Confidentiality degree

není předmětem státního či obchodního tajemství

Impact factor

Impact factor: 4.558

RIV identification code

RIV/00216224:14740/13:00066623

Organization unit

Central European Institute of Technology

UT WoS

000323020000013

Keywords (in Czech)

Diracův kužel; tenké vrstvy; povrchové stavy; pásová struktura; BI2TE3; BI2SE3; RAMAN; SELENID;

Keywords in English

SINGLE DIRAC CONE; THIN-FILMS; SURFACE-STATES; BAND-STRUCTURE; BI2TE3 FILMS; BI2SE3; RAMAN; SELENIDE;

Tags

Tags

International impact, Reviewed
Změněno: 13/3/2018 16:08, doc. Mgr. Adam Dubroka, Ph.D.

Abstract

V originále

Epitaxial growth of topological insulator bismuth telluride by molecular beam epitaxy onto BaF2 (111) substrates is studied using Bi2Te3 and Te as source materials. By changing the beam flux composition, different stoichiometric phases are obtained, resulting in high quality Bi2Te3 and Bi1Te1 epilayers as shown by Raman spectroscopy and high-resolution X-ray diffraction. From X-ray reciprocal space mapping, the residual strain, as well as size of coherently scattering domains are deduced. The Raman modes for the two different phases are identified and the dielectric functions derived from spectroscopic ellipsometry investigations. Angular resolved photoemission reveals topologically protected surface states of the Bi2Te3 epilayers. Thus, BaF2 is a perfectly suited substrate material for the bismuth telluride compounds.

In Czech

Epitaxní vrstvy teluridů bismutu byly připraveny molekulární epitaxí z Bi2Te3 a Te. Změna toku jednotlivých složek ovlivnovala strukturu vrstev, která byla zkoumána pomocí rtg difrakce, Ramanské spektroskopie.

Links

ED1.1.00/02.0068, research and development project
Name: CEITEC - central european institute of technology
GAP204/12/0595, research and development project
Name: Elektronové a strukturní vlastnosti trojrozměrných topologických izolantů
Investor: Czech Science Foundation