Detailed Information on Publication Record
2013
Growth, Structure, and Electronic Properties of Epitaxial Bismuth Telluride Topological Insulator Films on BaF2 (111) Substrates
CAHA, Ondřej, Adam DUBROKA, Josef HUMLÍČEK, Václav HOLÝ, Hubert STEINER et. al.Basic information
Original name
Growth, Structure, and Electronic Properties of Epitaxial Bismuth Telluride Topological Insulator Films on BaF2 (111) Substrates
Name in Czech
Růst, strukturní a elektronové vlastnosti epitaxních vrstvy topologického izolátoru bismut teluridu deponované na BaF2 substrátech
Authors
CAHA, Ondřej (203 Czech Republic, guarantor, belonging to the institution), Adam DUBROKA (203 Czech Republic, belonging to the institution), Josef HUMLÍČEK (203 Czech Republic, belonging to the institution), Václav HOLÝ (203 Czech Republic), Hubert STEINER (40 Austria), M. UL-HASSAN (40 Austria), Jaime SANCHEZ-BARRIGA (724 Spain), Oliver RADER (276 Germany), T. N. STANISLAVCHUK (840 United States of America), Andrei A. SIRENKO (840 United States of America), Günther BAUER (40 Austria) and Günter SPRINGHOLZ (40 Austria)
Edition
Crystal Growth & Design, Washington, American Chemical Society, 2013, 1528-7483
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10302 Condensed matter physics
Country of publisher
United States of America
Confidentiality degree
není předmětem státního či obchodního tajemství
Impact factor
Impact factor: 4.558
RIV identification code
RIV/00216224:14740/13:00066623
Organization unit
Central European Institute of Technology
UT WoS
000323020000013
Keywords (in Czech)
Diracův kužel; tenké vrstvy; povrchové stavy; pásová struktura; BI2TE3; BI2SE3; RAMAN; SELENID;
Keywords in English
SINGLE DIRAC CONE; THIN-FILMS; SURFACE-STATES; BAND-STRUCTURE; BI2TE3 FILMS; BI2SE3; RAMAN; SELENIDE;
Tags
Tags
International impact, Reviewed
Změněno: 13/3/2018 16:08, doc. Mgr. Adam Dubroka, Ph.D.
V originále
Epitaxial growth of topological insulator bismuth telluride by molecular beam epitaxy onto BaF2 (111) substrates is studied using Bi2Te3 and Te as source materials. By changing the beam flux composition, different stoichiometric phases are obtained, resulting in high quality Bi2Te3 and Bi1Te1 epilayers as shown by Raman spectroscopy and high-resolution X-ray diffraction. From X-ray reciprocal space mapping, the residual strain, as well as size of coherently scattering domains are deduced. The Raman modes for the two different phases are identified and the dielectric functions derived from spectroscopic ellipsometry investigations. Angular resolved photoemission reveals topologically protected surface states of the Bi2Te3 epilayers. Thus, BaF2 is a perfectly suited substrate material for the bismuth telluride compounds.
In Czech
Epitaxní vrstvy teluridů bismutu byly připraveny molekulární epitaxí z Bi2Te3 a Te. Změna toku jednotlivých složek ovlivnovala strukturu vrstev, která byla zkoumána pomocí rtg difrakce, Ramanské spektroskopie.
Links
ED1.1.00/02.0068, research and development project |
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GAP204/12/0595, research and development project |
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