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@inproceedings{1158979,
author = {Korytár, D. and Vagovič, P. and Ferrari, C. and Šiffalovič, P. and Jergel, M. and Dobročka, E. and Zápražný, Z. and Áč, V. and Mikulík, Petr},
address = {USA},
booktitle = {Advances in X-Ray/EUV Optics and Components VIII},
doi = {http://dx.doi.org/10.1117/12.2025142},
edition = {8848},
editor = {A. Khounsary, S. Goto, and C. Morawe},
keywords = {Bragg magnifier; X-ray diffraction; crystals},
howpublished = {tištěná verze "print"},
language = {eng},
location = {USA},
isbn = {978-0-8194-9698-0},
pages = {"88480U-1-88480U-8"},
publisher = {SPIE-INT SOC OPTICAL ENGINEERING},
title = {Process-induced inhomogeneities in higher asymmetry angle X-ray monochromators},
url = {http://www.sci.muni.cz/~mikulik/Publications.html#KorytarVagovicFerrari-SPIE-2013},
year = {2013}
}
TY - JOUR
ID - 1158979
AU - Korytár, D. - Vagovič, P. - Ferrari, C. - Šiffalovič, P. - Jergel, M. - Dobročka, E. - Zápražný, Z. - Áč, V. - Mikulík, Petr
PY - 2013
TI - Process-induced inhomogeneities in higher asymmetry angle X-ray monochromators
PB - SPIE-INT SOC OPTICAL ENGINEERING
CY - USA
SN - 9780819496980
KW - Bragg magnifier
KW - X-ray diffraction
KW - crystals
UR - http://www.sci.muni.cz/~mikulik/Publications.html#KorytarVagovicFerrari-SPIE-2013
N2 - Beam inhomogeneities of asymmetric Ge(220)-based V-shaped and single bounce monochromators have been studied both in metrological and imaging applications for photon energies around 8 keV. Presence of growth striations in graded GeSi, grains in single Cu crystal, and strains in thermally tuned V-channel monochromators observed in X-ray topographs excludes these materials from imaging applications. As for stochastic surface processing, chemomechanical polishing (CMP) produces better surface homogeneity than chemical polish. However, CMP is more difficult to be applied in V-channels, where chemical polishing is prefered. For comparison, measurements on surfaces processed by a deterministic mechanical method of single point diamond turning (SPDT) have shown SPDT to be a perspective technology. Again, to prepare deep grooves with this technique is also a challenge, mainly for tool makers. Some process induced features are observed as wavefield distortions in interference fringes.
ER -
KORYTÁR, D., P. VAGOVIČ, C. FERRARI, P. ŠIFFALOVIČ, M. JERGEL, E. DOBROČKA, Z. ZÁPRAŽNÝ, V. ÁČ and Petr MIKULÍK. Process-induced inhomogeneities in higher asymmetry angle X-ray monochromators. In A. Khounsary, S. Goto, and C. Morawe. \textit{Advances in X-Ray/EUV Optics and Components VIII}. 8848th ed. USA: SPIE-INT SOC OPTICAL ENGINEERING, 2013, p.~''88480U-1-88480U-8'', 8 pp. ISBN~978-0-8194-9698-0. Available from: https://dx.doi.org/10.1117/12.2025142.
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