Advanced modeling for optical characterization of amorphous hydrogenated silicon films

FRANTA, Daniel, David NEČAS, Lenka ZAJÍČKOVÁ, Ivan OHLÍDAL and Jiří STUCHLÍK. Advanced modeling for optical characterization of amorphous hydrogenated silicon films. Thin Solid Films. Lausanne: Elsevier Science, 2013, vol. 541, Aug, p. 12-16. ISSN 0040-6090. Available from: https://dx.doi.org/10.1016/j.tsf.2013.04.129.

Basic information

• Original name: Advanced modeling for optical characterization of amorphous hydrogenated silicon films
• Authors: FRANTA, Daniel (203 Czech Republic, guarantor, belonging to the institution), David NEČAS (203 Czech Republic, belonging to the institution), Lenka ZAJÍČKOVÁ (203 Czech Republic, belonging to the institution), Ivan OHLÍDAL (203 Czech Republic, belonging to the institution) and Jiří STUCHLÍK (203 Czech Republic).
• Edition: Thin Solid Films, Lausanne, Elsevier Science, 2013, 0040-6090.

Other information

• Original language: English
• Type of outcome: Article in a journal
• Field of Study: 10302 Condensed matter physics
• Country of publisher: Switzerland
• Confidentiality degree: is not subject to a state or trade secret
• WWW: URL
• Impact factor: Impact factor: 1.867
• RIV identification code: RIV/00216224:14740/13:00071634
• Organization unit: Central European Institute of Technology
• Doi: http://dx.doi.org/10.1016/j.tsf.2013.04.129
• UT WoS: 000323140600004
• Keywords in English: Ellipsometry; Spectrophotometry; a-Si:H; Urbach tail; Localized states; Sum rule
• Tags: podil, rivok
• Tags: International impact, Reviewed

Abstract

Amorphous hydrogenated silicon (a-Si:H) films deposited on glass and crystalline silicon substrates are analyzed using a multi-sample method combining ellipsometry and spectrophotometry in a spectral range of 0.046–8.9 eV, utilizing an analytical dispersion model based on parametrization of joint density of states and application of sum rule. This model includes all absorption processes from phonon absorption to core electron excitations. It is shown that if films deposited on both substrates are characterized together it is possible to study both phonon absorption and weak absorption processes below the band gap, i.e. the Urbach tail and absorption on localized states.

Links

• ED1.1.00/02.0068, research and development project: Name: CEITEC - central european institute of technology
• ED2.1.00/03.0086, research and development project: Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy