PROCHÁZKA, Pavel, Jindřich MACH, Dominik BISCHOFF, Zuzana LIŠKOVÁ, Petr DVOŘÁK, Marek VAŇATKA, Pauline SIMONET, Anastasia VARLET, Dušan HEMZAL, Martin PETRENEC, Lukáš KALINA, Miroslav BARTOŠÍK, Klaus ENSSLIN, Peter VARGA, Jan ČECHAL and Tomáš ŠIKOLA. Ultrasmooth metallic foils for growth of high quality graphene by chemical vapor deposition. NANOTECHNOLOGY. BRISTOL: IOP PUBLISHING LTD, 2014, vol. 25, No 18, p. 1-8. ISSN 0957-4484. Available from: https://dx.doi.org/10.1088/0957-4484/25/18/185601.
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Basic information
Original name Ultrasmooth metallic foils for growth of high quality graphene by chemical vapor deposition
Authors PROCHÁZKA, Pavel (203 Czech Republic), Jindřich MACH (203 Czech Republic), Dominik BISCHOFF (203 Czech Republic), Zuzana LIŠKOVÁ (203 Czech Republic), Petr DVOŘÁK (203 Czech Republic), Marek VAŇATKA (203 Czech Republic), Pauline SIMONET (203 Czech Republic), Anastasia VARLET (203 Czech Republic), Dušan HEMZAL (203 Czech Republic, guarantor, belonging to the institution), Martin PETRENEC (203 Czech Republic), Lukáš KALINA (203 Czech Republic), Miroslav BARTOŠÍK (203 Czech Republic), Klaus ENSSLIN (203 Czech Republic), Peter VARGA (203 Czech Republic), Jan ČECHAL (203 Czech Republic) and Tomáš ŠIKOLA (203 Czech Republic).
Edition NANOTECHNOLOGY, BRISTOL, IOP PUBLISHING LTD, 2014, 0957-4484.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10302 Condensed matter physics
Country of publisher United Kingdom of Great Britain and Northern Ireland
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 3.821
RIV identification code RIV/00216224:14740/14:00076532
Organization unit Central European Institute of Technology
Doi http://dx.doi.org/10.1088/0957-4484/25/18/185601
UT WoS 000334363600005
Keywords in English graphene; CVD growth; metallic foils
Tags kontrola MP, rivok
Tags International impact, Reviewed
Changed by Changed by: Martina Prášilová, učo 342282. Changed: 28/4/2015 11:30.
Abstract
Synthesis of graphene by chemical vapor deposition is a promising route for manufacturing large-scale high-quality graphene for electronic applications. The quality of the employed substrates plays a crucial role, since the surface roughness and defects alter the graphene growth and cause dif fi culties in the subsequent graphene transfer. Here, we report on ultrasmooth high- purity copper foils prepared by sputter deposition of Cu thin fi lm on a SiO 2 /Si template, and the subsequent peeling off of the metallic layer from the template. The surface displays a low level of oxidation and contamination, and the roughness of the foil surface is generally de fi ned by the template, and was below 0.6 nm even on a large scale. The roughness and grain size increase occurred during both the annealing of the foils, and catalytic growth of graphene from methane ( +- 1000 °C), but on the large scale still remained far below the roughness typical for commercial foils. The micro-Raman spectroscopy and transport measurements proved the high quality of graphene grown on such foils, and the room temperature mobility of the graphene grown on the template stripped foil was three times higher compared to that of one grown on the commercial copper foil. The presented high-quality copper foils are expected to provide large-area substrates suitable for electronic applications.
Links
ED1.1.00/02.0068, research and development projectName: CEITEC - central european institute of technology
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