J 2015

Studying a low-pressure microwave coaxial discharge in hydrogen using a mixed 2D/3D fluid model

OBRUSNÍK, Adam and Zdeněk BONAVENTURA

Basic information

Original name

Studying a low-pressure microwave coaxial discharge in hydrogen using a mixed 2D/3D fluid model

Authors

OBRUSNÍK, Adam (203 Czech Republic, belonging to the institution) and Zdeněk BONAVENTURA (203 Czech Republic, guarantor, belonging to the institution)

Edition

Journal of physics D: Applied physics, Bristol, England, IOP Publishing Ltd. 2015, 0022-3727

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

Impact factor

Impact factor: 2.772

RIV identification code

RIV/00216224:14310/15:00080658

Organization unit

Faculty of Science

UT WoS

000348842600006

Keywords in English

microwave plasma; hydrogen; low-pressure; fluid model; coaxial discharge; plasmaline; nanocrystalline diamond

Tags

Tags

International impact, Reviewed
Změněno: 12/4/2016 13:32, Ing. Andrea Mikešková

Abstract

V originále

This work presents a numerical model of hydrogen plasma in a microwave coaxial discharge at low pressure (25–250 Pa). The model is a mixed two-dimensional (2D)/three-dimensional (3D) model in that it combines three-dimensional geometry for the electromagnetic field and two-dimensional geometry for the transport equations. The model is validated against experimental results available in the literature and, where possible, simulations of comparable discharges. The model shows reasonable agreement in the relevant pressure range. A parametric study with respect to pressure is carried out and it is observed that the plasma contracts towards the quartz tube with increasing pressure. Increasing the pressure also influences the abundance of H + ions but on the other hand it has little impact on hydrogen dissociation degree and electron temperature. Furthermore, the uniformity of the plasma above the substrate holder is analyzed. It is observed that at pressures over 150 Pa, the plasma gets non-uniform in the direction parallel to the plasma lines. Finally, the uniformity of particle and energy fluxes to the substrate holder are analyzed. Knowing the fluxes is especially useful for the material applications of the device.

Links

GAP205/12/0908, research and development project
Name: Pokročilý experimentální výzkum mikrovlnného plazmového systému pro přípravu velkoplošných nanodiamantových vrstev
Investor: Czech Science Foundation

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