Detailed Information on Publication Record
2015
Studying a low-pressure microwave coaxial discharge in hydrogen using a mixed 2D/3D fluid model
OBRUSNÍK, Adam and Zdeněk BONAVENTURABasic information
Original name
Studying a low-pressure microwave coaxial discharge in hydrogen using a mixed 2D/3D fluid model
Authors
OBRUSNÍK, Adam (203 Czech Republic, belonging to the institution) and Zdeněk BONAVENTURA (203 Czech Republic, guarantor, belonging to the institution)
Edition
Journal of physics D: Applied physics, Bristol, England, IOP Publishing Ltd. 2015, 0022-3727
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10305 Fluids and plasma physics
Country of publisher
United Kingdom of Great Britain and Northern Ireland
Confidentiality degree
není předmětem státního či obchodního tajemství
References:
Impact factor
Impact factor: 2.772
RIV identification code
RIV/00216224:14310/15:00080658
Organization unit
Faculty of Science
UT WoS
000348842600006
Keywords in English
microwave plasma; hydrogen; low-pressure; fluid model; coaxial discharge; plasmaline; nanocrystalline diamond
Tags
International impact, Reviewed
Změněno: 12/4/2016 13:32, Ing. Andrea Mikešková
Abstract
V originále
This work presents a numerical model of hydrogen plasma in a microwave coaxial discharge at low pressure (25–250 Pa). The model is a mixed two-dimensional (2D)/three-dimensional (3D) model in that it combines three-dimensional geometry for the electromagnetic field and two-dimensional geometry for the transport equations. The model is validated against experimental results available in the literature and, where possible, simulations of comparable discharges. The model shows reasonable agreement in the relevant pressure range. A parametric study with respect to pressure is carried out and it is observed that the plasma contracts towards the quartz tube with increasing pressure. Increasing the pressure also influences the abundance of H + ions but on the other hand it has little impact on hydrogen dissociation degree and electron temperature. Furthermore, the uniformity of the plasma above the substrate holder is analyzed. It is observed that at pressures over 150 Pa, the plasma gets non-uniform in the direction parallel to the plasma lines. Finally, the uniformity of particle and energy fluxes to the substrate holder are analyzed. Knowing the fluxes is especially useful for the material applications of the device.
Links
GAP205/12/0908, research and development project |
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