ELIÁŠ, Marek, Petr KLOC, Ondřej JAŠEK, Věra MAZÁNKOVÁ, David TRUNEC, Radim HRDÝ and Lenka ZAJÍČKOVÁ. Atmospheric pressure barrier discharge at high temperature: Diagnostics and carbon nanotubes deposition. Journal of Applied Physics. Melville (USA): AMER INST PHYSICS, 2015, vol. 117, No 10, p. "nestránkováno", 10 pp. ISSN 0021-8979. Available from: https://dx.doi.org/10.1063/1.4914062.
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Basic information
Original name Atmospheric pressure barrier discharge at high temperature: Diagnostics and carbon nanotubes deposition
Name in Czech Bariérový výboj za atmosférického tlaku při vysoké teplotě: Diganostika a růst uhlíkových nanotrubek
Authors ELIÁŠ, Marek (203 Czech Republic, guarantor, belonging to the institution), Petr KLOC (203 Czech Republic, belonging to the institution), Ondřej JAŠEK (203 Czech Republic, belonging to the institution), Věra MAZÁNKOVÁ (203 Czech Republic, belonging to the institution), David TRUNEC (203 Czech Republic, belonging to the institution), Radim HRDÝ (203 Czech Republic) and Lenka ZAJÍČKOVÁ (203 Czech Republic, belonging to the institution).
Edition Journal of Applied Physics, Melville (USA), AMER INST PHYSICS, 2015, 0021-8979.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
WWW web vydavatele
Impact factor Impact factor: 2.101
RIV identification code RIV/00216224:14740/15:00080701
Organization unit Central European Institute of Technology
Doi http://dx.doi.org/10.1063/1.4914062
UT WoS 000351442900010
Keywords (in Czech) bariérový výboj; vysoká teplota; diagnostika plazmatu; uhlíkové nanotrubky
Keywords in English barrier discharge; high temperature; plasma diagnostics; carbon nanotubes
Tags podil, rivok
Tags International impact, Reviewed
Changed by Changed by: doc. Mgr. Lenka Zajíčková, Ph.D., učo 1414. Changed: 19/9/2017 04:55.
Abstract
Atmospheric pressure dielectric barrier discharge (DBD) in Ar/H-2 gas feed with C2H2 or CH4 admixture was studied at room and high temperature of 680 degrees C by plasma diagnostics (electrical measurements, fast camera imaging, and optical emission spectroscopy). It was shown that filamentary DBD in pure Ar or Ar/H-2 can be converted into homogeneous discharge by an acetylene admixture. Fast intensified charge-coupled device (ICCD) camera proved that this homogeneous discharge is an atmospheric pressure glow discharge (APGD) at room temperature whereas at high temperature the discharge mode switches at every half-period between APGD and atmospheric pressure Townsend discharge. The high temperature discharges (610-710 degrees C) in Ar/H-2/C2H2 and Ar/H-2/CH4 were also investigated with respect to a surface bound deposition of carbon nanotubes using 5 nm thick iron layer as a catalyst. CNTs were deposited without any dedicated catalyst pretreatment phase. The quality of CNTs, namely, their density, vertical alignment, and width of the diameter distribution, was better for the C2H2 gas feed and higher temperatures. (C) 2015 AIP Publishing LLC.
Abstract (in Czech)
Bariérový výboj za atmosférického tlaku ve směsi Ar/H2 s příměsí C2H2 a CH4 byl studován za pokojové a vysoké teploty. Výboj za vysoké teploty (610-710°C) ve směsi Ar/H2/C2H2 a Ar/H2/CH4 byl studován za účelem růstu uhlíkových nanotrubek.
Links
ED1.1.00/02.0068, research and development projectName: CEITEC - central european institute of technology
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
GAP205/10/1374, research and development projectName: Syntéza uhlíkových nanotrubek plazmochemickou metodou a studium jejich funkčních vlastností
Investor: Czech Science Foundation
GA13-24635S, research and development projectName: Spektroskopické studium rekombinace povrchového náboje v dielektrických bariérových výbojích
Investor: Czech Science Foundation
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
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