MANAKHOV, Anton, Lenka ZAJÍČKOVÁ, Marek ELIÁŠ, Jan ČECHAL, Josef POLČÁK, Jaroslav HNILICA, Štěpánka BITTNEROVÁ and David NEČAS. Optimization of Cyclopropylamine Plasma Polymerization toward Enhanced Layer Stability in Contact with Water. Plasma Processes and Polymers. Weinheim BRD: Wiley-VCH, 2014, vol. 11, No 6, p. 532-544. ISSN 1612-8850. doi:10.1002/ppap.201300177.
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Basic information
Original name Optimization of Cyclopropylamine Plasma Polymerization toward Enhanced Layer Stability in Contact with Water
Authors MANAKHOV, Anton (643 Russian Federation, belonging to the institution), Lenka ZAJÍČKOVÁ (203 Czech Republic, guarantor, belonging to the institution), Marek ELIÁŠ (203 Czech Republic, belonging to the institution), Jan ČECHAL (203 Czech Republic), Josef POLČÁK (203 Czech Republic), Jaroslav HNILICA (203 Czech Republic, belonging to the institution), Štěpánka BITTNEROVÁ (203 Czech Republic, belonging to the institution) and David NEČAS (203 Czech Republic, belonging to the institution).
Edition Plasma Processes and Polymers, Weinheim BRD, Wiley-VCH, 2014, 1612-8850.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10302 Condensed matter physics
Country of publisher Germany
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 2.453
RIV identification code RIV/00216224:14740/14:00079905
Organization unit Central European Institute of Technology
UT WoS 000337626000003
Keywords in English amine coatings; cyclopropylamine; ESCA; XPS; FT-IR; pulsed discharges
Tags kontrola MP, MP, podil, rivok
Tags International impact, Reviewed
Changed by Changed by: Martina Prášilová, učo 342282. Changed: 30. 3. 2015 12:03.
The present investigation of cyclopropylamine (CPA) plasma polymerization in pulsed and continuous wave radio frequency (RF) discharges leads to the proposition of conditions at which amine-rich films exhibit a good stability in contact with water. The analyses reveal complex structure of CPA plasma polymers containing hydrocarbon chains, primary and secondary amines, nitriles and possibly imines. The decomposition of the monomer in plasma is progressing with the composite parameter W/F (RF power over monomer flow rate) but, in pulsed discharges, it is possible to deposit the films with N/C ratio above 0.24 using higher monomer flow rate. At the optimized monomer flow rate the 280nm thick film exhibits only 20% thickness loss after 48h immersion in water and still contains about 5at% of the NHx environment.
ED1.1.00/02.0068, research and development projectName: CEITEC - central european institute of technology
EE2.3.30.0009, research and development projectName: Zaměstnáním čerstvých absolventů doktorského studia k vědecké excelenci
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