ZÁPRAŽNÝ, Z., D. KORYTÁR, P. ŠIFFALOVIČ, M. JERGEL, M. DEMYDENKO, Petr MIKULÍK, E. DOBROČKA, C. FERRARI, P. VAGOVIČ and M. MIKLOŠKA. Simulations and surface quality testing of high asymmetry angle X-ray crystal monochromators for advanced X-ay imaging applications. In C. Morawe, A. Khounsary, and S. Goto. Advances in X-Ray/EUV Optics and Components IX. 9207th ed. USA: SPIE-INT SOC OPTICAL ENGINEERING, 2014, p. "nestránkováno", 14 pp. ISBN 978-1-62841-234-5. Available from: https://dx.doi.org/10.1117/12.2061353.
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Basic information
Original name Simulations and surface quality testing of high asymmetry angle X-ray crystal monochromators for advanced X-ay imaging applications
Authors ZÁPRAŽNÝ, Z. (703 Slovakia), D. KORYTÁR (703 Slovakia), P. ŠIFFALOVIČ (703 Slovakia), M. JERGEL (703 Slovakia), M. DEMYDENKO (703 Slovakia), Petr MIKULÍK (643 Russian Federation, guarantor, belonging to the institution), E. DOBROČKA (703 Slovakia), C. FERRARI (380 Italy), P. VAGOVIČ (703 Slovakia) and M. MIKLOŠKA (703 Slovakia).
Edition 9207. vyd. USA, Advances in X-Ray/EUV Optics and Components IX, p. "nestránkováno", 14 pp. 2014.
Publisher SPIE-INT SOC OPTICAL ENGINEERING
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10302 Condensed matter physics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
Publication form printed version "print"
WWW URL
RIV identification code RIV/00216224:14740/14:00079915
Organization unit Central European Institute of Technology
ISBN 978-1-62841-234-5
ISSN 0277-786X
Doi http://dx.doi.org/10.1117/12.2061353
UT WoS 000343877600030
Keywords in English Crystals ; Monochromators ; Simulations ; Surface quality testing ; X-ray imaging ; X-rays ; Germanium ; Single point diamond turning ; Polishing ; Reflectivity
Tags rivok
Tags International impact, Reviewed
Changed by Changed by: Martina Prášilová, učo 342282. Changed: 28/4/2015 12:48.
Abstract
Advanced X-ray imaging techniques of weakly absorbing structures require an increase of the sensitivity to small refractive angles considering that they are based more on coherent X-ray phase contrast than on X-ray absorption one. Simulations of diffraction properties of germanium (Ge) X-ray crystal monochromators and of analyzer based imaging (ABI) method were performed for various asymmetry factors and several lattice plane orientations using an X-ray energy range from 8 keV to 20 keV. Using an appropriate phase/amplitude retrieval method one can recover the phase information from the ABI image, which is directly proportional to the projected electron density. We are using germanium based optics for X-ray imaging or image magnification. The use of Ge crystals offers several advantages over silicon crystals. The integrated reflectivity of Ge crystals is two to three times larger than that of Si crystals. The spatial resolution of Ge magnifiers is typically two times better than the spatial resolution of Si magnifiers. We used high asymmetry diffractions to increase effectively the propagation distance and decrease the effective pixel size of the detector, to achieve a sufficient magnification of the sample and to improve coherence and increase output intensity. The most important parameter of a highly asymmetric monochromators as image magnifiers is the crystal surface quality. We have applied several crystal surface finishing methods including conventional mechanical lapping, chemical polishing, chemo-mechanical polishing and advanced nano-machining using single point diamond turning (SPDT), and we have evaluated these methods by means of AFM, diffractometry, reciprocal space mapping and others.
Links
ED1.1.00/02.0068, research and development projectName: CEITEC - central european institute of technology
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