Detailed Information on Publication Record
2015
Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrological applications
ZÁPRAŽNÝ, Z., D. KORYTÁR, M. JERGEL, P. ŠIFFALOVIČ, E. DOBROČKA et. al.Basic information
Original name
Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrological applications
Authors
ZÁPRAŽNÝ, Z. (703 Slovakia), D. KORYTÁR (703 Slovakia), M. JERGEL (703 Slovakia), P. ŠIFFALOVIČ (703 Slovakia), E. DOBROČKA (703 Slovakia), P. VAGOVIČ (703 Slovakia), C. FERRARI (703 Slovakia), Petr MIKULÍK (203 Czech Republic, guarantor, belonging to the institution), M. DEMYDENKO (643 Russian Federation) and M. MIKLOŠKA (703 Slovakia)
Edition
Optical Engineering, 2015, 0091-3286
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10302 Condensed matter physics
Country of publisher
United States of America
Confidentiality degree
není předmětem státního či obchodního tajemství
References:
Impact factor
Impact factor: 0.984
RIV identification code
RIV/00216224:14310/15:00082630
Organization unit
Faculty of Science
UT WoS
000351587500029
Keywords in English
Crystals ; Monochromators ; Simulations ; Surface quality testing ; X-ray imaging ; X-rays ; Germanium ; Single point diamond turning ; Polishing
Tags
Změněno: 29/3/2016 14:50, Ing. Andrea Mikešková
Abstract
V originále
We present the numerical optimization and the technological development progress of x-ray optics based on asymmetric germanium crystals. We show the results of several basic calculations of diffraction properties of germanium x-ray crystal monochromators and of an analyzer-based imaging method for various asymmetry factors using an x-ray energy range from 8 to 20 keV. The important parameter of highly asymmetric monochromators as image magnifiers or compressors is the crystal surface quality. We have applied several crystal surface finishing methods, including advanced nanomachining using single-point diamond turning (SPDT), conventional mechanical lapping, chemical polishing, and chemomechanical polishing, and we have evaluated these methods by means of atomic force microscopy, diffractometry, reciprocal space mapping, and others. Our goal is to exclude the chemical etching methods as the final processing technique because it causes surface undulations. The aim is to implement very precise deterministic methods with a control of surface roughness down to 0.1 nm. The smallest roughness (~0.3 nm), best planarity, and absence of the subsurface damage were observed for the sample which was machined using an SPDT with a feed rate of 1 mm/min and was consequently polished using a fine polishing 15-min process with a solution containing SiO2 nanoparticles (20 nm).
Links
| ED1.1.00/02.0068, research and development project |
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