NEČAS, David, Ivan OHLÍDAL, Daniel FRANTA, Vladimír ČUDEK, Miloslav OHLÍDAL, Jiří VODÁK, Lucia SLÁDKOVÁ, Lenka ZAJÍČKOVÁ, Marek ELIÁŠ a František VIZĎA. Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry. Thin Solid Films. Lausanne: Elsevier Science, roč. 571, november, s. 573-578. ISSN 0040-6090. doi:10.1016/j.tsf.2013.12.036. 2014. |
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@article{1232792, author = {Nečas, David and Ohlídal, Ivan and Franta, Daniel and Čudek, Vladimír and Ohlídal, Miloslav and Vodák, Jiří and Sládková, Lucia and Zajíčková, Lenka and Eliáš, Marek and Vizďa, František}, article_location = {Lausanne}, article_number = {november}, doi = {http://dx.doi.org/10.1016/j.tsf.2013.12.036}, keywords = {Variable-angle spectroscopic ellipsometry; Mapping spectroscopic ellipsometry; Imaging spectroscopic reflectometry; Non-uniform thin films}, language = {eng}, issn = {0040-6090}, journal = {Thin Solid Films}, title = {Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry}, url = {http://ac.els-cdn.com/S0040609013021007/1-s2.0-S0040609013021007-main.pdf?_tid=83eecb72-d868-11e4-9e7b-00000aab0f6c&acdnat=1427890593_5f13d02ce4a284783378d30a332962c6}, volume = {571}, year = {2014} }
TY - JOUR ID - 1232792 AU - Nečas, David - Ohlídal, Ivan - Franta, Daniel - Čudek, Vladimír - Ohlídal, Miloslav - Vodák, Jiří - Sládková, Lucia - Zajíčková, Lenka - Eliáš, Marek - Vizďa, František PY - 2014 TI - Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry JF - Thin Solid Films VL - 571 IS - november SP - 573-578 EP - 573-578 PB - Elsevier Science SN - 00406090 KW - Variable-angle spectroscopic ellipsometry KW - Mapping spectroscopic ellipsometry KW - Imaging spectroscopic reflectometry KW - Non-uniform thin films UR - http://ac.els-cdn.com/S0040609013021007/1-s2.0-S0040609013021007-main.pdf?_tid=83eecb72-d868-11e4-9e7b-00000aab0f6c&acdnat=1427890593_5f13d02ce4a284783378d30a332962c6 L2 - http://ac.els-cdn.com/S0040609013021007/1-s2.0-S0040609013021007-main.pdf?_tid=83eecb72-d868-11e4-9e7b-00000aab0f6c&acdnat=1427890593_5f13d02ce4a284783378d30a332962c6 N2 - Standard variable-angle spectroscopic ellipsometry, mapping spectroscopic ellipsometry with microspot and imaging spectroscopic reflectometry are applied to optical characterisation of a thin SiOxCyHz film considerably non-uniform in thickness and which is also suspected of non-uniformity also in the optical constants. It is shown that using the combination of these three optical methods, enables us to determine the spectral dependencies of the optical constants of the film together with parameters characterising the shape of thickness non-uniformity and fine map of local thickness. The mapping spectroscopic ellipsometry with microspot enables deciding whether the film is non-uniform in optical constants. For the thin film studied it is found that the non-uniformity in optical constants is under experimental accuracy. The consistency of results obtained using individual techniques is checked and the advantages and disadvantages of the techniques are discussed. (C) 2013 Elsevier B.V. All rights reserved. ER -
NEČAS, David, Ivan OHLÍDAL, Daniel FRANTA, Vladimír ČUDEK, Miloslav OHLÍDAL, Jiří VODÁK, Lucia SLÁDKOVÁ, Lenka ZAJÍČKOVÁ, Marek ELIÁŠ a František VIZĎA. Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry. \textit{Thin Solid Films}. Lausanne: Elsevier Science, roč.~571, november, s.~573-578. ISSN~0040-6090. doi:10.1016/j.tsf.2013.12.036. 2014.
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