Temporal evolution of sputtered species densities in multi-pulse HiPIMS discharge
| FEKETE, Matej, Jaroslav HNILICA and Petr VAŠINA. Temporal evolution of sputtered species densities in multi-pulse HiPIMS discharge. In 6th Central European Symposium on Plasma Chemistry. 2015. ISBN 978-88-6938-045-7. |
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| Basic information | |
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| Original name | Temporal evolution of sputtered species densities in multi-pulse HiPIMS discharge |
| Authors | FEKETE, Matej (703 Slovakia, belonging to the institution), Jaroslav HNILICA (203 Czech Republic, belonging to the institution) and Petr VAŠINA (203 Czech Republic, guarantor, belonging to the institution). |
| Edition | 6th Central European Symposium on Plasma Chemistry, 2015. |
| Other information | |
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| Original language | English |
| Type of outcome | Conference abstract |
| Field of Study | 10305 Fluids and plasma physics |
| Country of publisher | Italy |
| Confidentiality degree | is not subject to a state or trade secret |
| RIV identification code | RIV/00216224:14310/15:00081016 |
| Organization unit | Faculty of Science |
| ISBN | 978-88-6938-045-7 |
| Keywords in English | HiPIMS; OES; titanium |
| Tags | International impact |
| Changed by | Changed by: doc. Mgr. Jaroslav Hnilica, Ph.D., učo 106259. Changed: 7/12/2015 11:06. |
| Abstract |
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| Number densities of sputtered Ti atoms and ions in their ground levels were determined by developed technique based on effective branching fractions. Densities were determined for single pulse,sequence of pulses and after the end of the pulse. |
| Links | |
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| ED2.1.00/03.0086, research and development project | Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy |
| GAP205/12/0407, research and development project | Name: Porozumění hybridnímu PVD-PECVD procesu s cílem řídit růst nanostrukturovaných kompozitních vrstev |
| Investor: Czech Science Foundation | |
| GA15-00863S, research and development project | Name: Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace |
| Investor: Czech Science Foundation | |
| LO1411, research and development project | Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus) |
| Investor: Ministry of Education, Youth and Sports of the CR | |
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