KLEIN, Peter, Jaroslav HNILICA, Petr VAŠINA, Zdeněk HUBIČKA and Martin ČADA. Cathode voltage and discharge current oscillations and spoke behavior during HiPIMS discharge. In Sixth International Conference on Fundamentals and Industrial Applications of HIPIMS. 2015.
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Basic information
Original name Cathode voltage and discharge current oscillations and spoke behavior during HiPIMS discharge
Authors KLEIN, Peter (703 Slovakia, belonging to the institution), Jaroslav HNILICA (203 Czech Republic, belonging to the institution), Petr VAŠINA (203 Czech Republic, guarantor, belonging to the institution), Zdeněk HUBIČKA (203 Czech Republic) and Martin ČADA (203 Czech Republic).
Edition Sixth International Conference on Fundamentals and Industrial Applications of HIPIMS, 2015.
Other information
Original language English
Type of outcome Presentations at conferences
Field of Study 10305 Fluids and plasma physics
Country of publisher Germany
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/15:00081043
Organization unit Faculty of Science
Keywords in English HIPIMS;spoke;oscillation
Tags International impact
Changed by Changed by: doc. Mgr. Jaroslav Hnilica, Ph.D., učo 106259. Changed: 7/12/2015 11:00.
Abstract
The spokes presence and their behavior were studied by high-speed imaging. The spoke appearance was strongly dependent on the pressure. At very low pressure, the triangular spoke shape was well recognized but with increasing pressure the shape became diffusive. Overreaching 2 Pa there was no spokes recognizable. Camera enables to record two successive images from the same pulse with time delay of 3 µs.Spoke rotation velocity and frequency was derived from the spoke image shift in the pressure range 0.18-0.5 Pa, where the spokes were well distinguished. The spoke characteristic frequency was arbitrary determined as multiplication of number of spokes with rotation frequency and ranges from 77 to 178 kHz. Spoke characteristic frequency is in the same order of magnitude as observed oscillations on cathode voltage and discharge current, nevertheless they are not identical. Spoke characteristic frequency is 3-4 times lower than the frequency of the oscillations.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
GAP205/12/0407, research and development projectName: Porozumění hybridnímu PVD-PECVD procesu s cílem řídit růst nanostrukturovaných kompozitních vrstev
Investor: Czech Science Foundation
GA15-00863S, research and development projectName: Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace
Investor: Czech Science Foundation
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
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