Detection of hydrogen radicals in a dielectric barrier discharge by laser-induced fluorescence

DVOŘÁK, Pavel and Marek TALÁBA. Detection of hydrogen radicals in a dielectric barrier discharge by laser-induced fluorescence. In ICPIG - International Conference on Phenomena in Ionized Gases. 2015.

Basic information

• Original name: Detection of hydrogen radicals in a dielectric barrier discharge by laser-induced fluorescence
• Name in Czech: Detekce vodíkových radikálů v dielektrickém bariérovém výboji pomocí laserem indukované fluorescence
• Authors: DVOŘÁK, Pavel (203 Czech Republic, belonging to the institution) and Marek TALÁBA (703 Slovakia, guarantor).
• Edition: ICPIG - International Conference on Phenomena in Ionized Gases, 2015.

Other information

• Original language: English
• Type of outcome: Conference abstract
• Field of Study: 10305 Fluids and plasma physics
• Country of publisher: Romania
• Confidentiality degree: is not subject to a state or trade secret
• RIV identification code: RIV/00216224:14310/15:00081153
• Organization unit: Faculty of Science
• Keywords (in Czech): plazma; DBD; vodík; TALIF
• Keywords in English: plasma; DBD; hydrogen; TALIF
• Tags: AKR
• Tags: International impact, Reviewed

Abstract

Absolute atomic hydrogen densities were measured by two-photon absorption laser-induced fluorescence (TALIF) in a volume dielectric barrier discharge, which was ignited in a mixture of argon and hydrogen in a plasma reactor at atmospheric pressure. Hydrogen atoms were excited by laser radiation with the wavelength 205 nm. We identified the main fluorescence parameters, e.g. the degree of saturation, the spectral profile of the absorption line and the dependency of the signal on the discharge phase. The calibration was done using TALIF of krypton with the 204 nm wavelength. The absolute concentrations of atomic hydrogen were determined based on different parameters of the system, e.g. the flow rate of the studied gases and the generator voltage.

Abstract (in Czech)

Měření koncentrace jednoatomových radikálů vodíku pomocí TALIF v dielektrickém bariérovém výboji.

Links

• ED2.1.00/03.0086, research and development project: Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
• GA13-24635S, research and development project: Name: Spektroskopické studium rekombinace povrchového náboje v dielektrických bariérových výbojích

Investor: Czech Science Foundation

• LO1411, research and development project: Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)

Investor: Ministry of Education, Youth and Sports of the CR

• 7AMB14SK204, research and development project: Name: Studium nerovnovážného difúzního plazmatu generovaného ve vodních parách za atmosférického tlaku optickými a laserovými metodami (Acronym: LIFOH)

Investor: Ministry of Education, Youth and Sports of the CR