SCHÄFER, Jan, Jaroslav HNILICA, Jiří ŠPERKA, Antje QUADE, Vít KUDRLE, Rüdiger FOEST, Jiří VODÁK and Lenka ZAJÍČKOVÁ. Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure. Surface and Coatings Technology. 2016, vol. 295, 15 June 2016, p. 112-118. ISSN 0257-8972. Available from: https://dx.doi.org/10.1016/j.surfcoat.2015.09.047.
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Basic information
Original name Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure
Authors SCHÄFER, Jan (203 Czech Republic), Jaroslav HNILICA (203 Czech Republic, belonging to the institution), Jiří ŠPERKA (203 Czech Republic, belonging to the institution), Antje QUADE (276 Germany), Vít KUDRLE (203 Czech Republic, guarantor, belonging to the institution), Rüdiger FOEST (276 Germany), Jiří VODÁK (203 Czech Republic, belonging to the institution) and Lenka ZAJÍČKOVÁ (203 Czech Republic, belonging to the institution).
Edition Surface and Coatings Technology, 2016, 0257-8972.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher United Kingdom of Great Britain and Northern Ireland
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 2.589
RIV identification code RIV/00216224:14310/16:00087594
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1016/j.surfcoat.2015.09.047
UT WoS 000376834700017
Keywords in English Tetrakis(trimethylsilyloxy)silane; Tetrakis(trimethylsiloxy)silane; Plasma jet; Silicon dioxide
Tags International impact, Reviewed
Changed by Changed by: doc. Mgr. Jaroslav Hnilica, Ph.D., učo 106259. Changed: 26/2/2019 07:02.
Abstract
We performed the thin films deposition using atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) by means of a radiofrequency and a microwave plasma jets operating with mixtures of argon and tetrakis(trimethylsilyloxy)silane (TTMS).
Links
ED1.1.00/02.0068, research and development projectName: CEITEC - central european institute of technology
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
TE02000011, research and development projectName: Centrum výzkumu povrchových úprav (Acronym: povrchovky)
Investor: Technology Agency of the Czech Republic
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  • a concrete person Mgr. Jiří Šperka, Ph.D., učo 208123
  • a concrete person Ing. Jiří Vodák, Ph.D., učo 239142
  • a concrete person prof. Mgr. Vít Kudrle, Ph.D., učo 2560
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