J 2016

Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure

SCHÄFER, Jan, Jaroslav HNILICA, Jiří ŠPERKA, Antje QUADE, Vít KUDRLE et. al.

Basic information

Original name

Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure

Authors

SCHÄFER, Jan (203 Czech Republic), Jaroslav HNILICA (203 Czech Republic, belonging to the institution), Jiří ŠPERKA (203 Czech Republic, belonging to the institution), Antje QUADE (276 Germany), Vít KUDRLE (203 Czech Republic, guarantor, belonging to the institution), Rüdiger FOEST (276 Germany), Jiří VODÁK (203 Czech Republic, belonging to the institution) and Lenka ZAJÍČKOVÁ (203 Czech Republic, belonging to the institution)

Edition

Surface and Coatings Technology, 2016, 0257-8972

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

Impact factor

Impact factor: 2.589

RIV identification code

RIV/00216224:14310/16:00087594

Organization unit

Faculty of Science

DOI

UT WoS

000376834700017

Keywords in English

Tetrakis(trimethylsilyloxy)silane; Tetrakis(trimethylsiloxy)silane; Plasma jet; Silicon dioxide

Tags

International impact, Reviewed
Změněno: 26/2/2019 07:02, doc. Mgr. Jaroslav Hnilica, Ph.D.

Abstract

V originále

We performed the thin films deposition using atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) by means of a radiofrequency and a microwave plasma jets operating with mixtures of argon and tetrakis(trimethylsilyloxy)silane (TTMS).

Links

ED1.1.00/02.0068, research and development project
Name: CEITEC - central european institute of technology
ED2.1.00/03.0086, research and development project
Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
LO1411, research and development project
Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
TE02000011, research and development project
Name: Centrum výzkumu povrchových úprav (Acronym: povrchovky)
Investor: Technology Agency of the Czech Republic

Files attached

1-s2.0-S0257897215302851-main.pdf
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