Determination of titanium atom and ion densities in sputter
deposition plasmas by optical emission spectroscopy

J 2015

Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy

VAŠINA, Petr, Matej FEKETE, Jaroslav HNILICA, Peter KLEIN, Lenka DOSOUDILOVÁ et. al.

Basic information

Original name

Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy

Authors

VAŠINA, Petr (203 Czech Republic, guarantor, belonging to the institution), Matej FEKETE (703 Slovakia, belonging to the institution), Jaroslav HNILICA (203 Czech Republic, belonging to the institution), Peter KLEIN (703 Slovakia, belonging to the institution), Lenka DOSOUDILOVÁ (203 Czech Republic, belonging to the institution), Pavel DVOŘÁK (203 Czech Republic, belonging to the institution) and Zdeněk NAVRÁTIL (203 Czech Republic, belonging to the institution)

Edition

Plasma Sources Science and Technology, 2015, 0963-0252

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 2.808

RIV identification code

RIV/00216224:14310/15:00081243

Organization unit

Faculty of Science

DOI

http://dx.doi.org/10.1088/0963-0252/24/6/065022

UT WoS

000368117100027

Keywords in English

sputter species density; magnetron; HIPIMS; plasma diagnostics; titanium

Abstract

V originále

The thorough characterizations of deposition plasma lead to important achievements in the fundamental understanding of the deposition process, with a clear impact on the development of technology. Measurement of the spatial and, in the case of pulse excited plasma, also temporal evolution, of the concentrations of sputtered atoms and ions is a primary task in the diagnostics of any sputter deposition plasma. However, it is difficult to estimate absolute number densities of the sputtered species (atoms and ions) in ground states directly from optical emission spectroscopy, because the species in the ground levels do not produce any optical signal. A method using effective branching fractions enables us to determine the density of non-radiating species from the intensities of self-absorbed spectral lines. The branching fractions method described in the first part of this paper was applied to determine the ground state densities of the sputtered titanium atoms and ions. The method is based on fitting the theoretically calculated branching fractions to experimentally measured ratios of the relative intensities of carefully selected resonant titanium atomic and ionic lines. The sputtered species density is determined in our experimental setup with a relative uncertainty of less than 5% for the dc driven magnetron and typically 15% for time-resolved measurements of high- power impulse magnetron sputtering (HiPIMS) discharge. In the second part of the paper, the method was applied to determine the evolution of titanium atom and ion densities in three typical cases ranging from the dc driven sputter process to HiPIMS.

Links

ED2.1.00/03.0086, research and development project

Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

GA15-00863S, research and development project

Name: Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace

Investor: Czech Science Foundation

LO1411, research and development project

Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)

Investor: Ministry of Education, Youth and Sports of the CR

Citovat

VAŠINA, Petr, Matej FEKETE, Jaroslav HNILICA, Peter KLEIN, Lenka DOSOUDILOVÁ, Pavel DVOŘÁK and Zdeněk NAVRÁTIL. Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy. Plasma Sources Science and Technology. 2015, vol. 24, No 6, p. "nestránkováno", 13 pp. ISSN 0963-0252. Available from: https://dx.doi.org/10.1088/0963-0252/24/6/065022.

@article{1318794,
   author = {Vašina, Petr and Fekete, Matej and Hnilica, Jaroslav and Klein, Peter and Dosoudilová, Lenka and Dvořák, Pavel and Navrátil, Zdeněk},
   article_number = {6},
   doi = {http://dx.doi.org/10.1088/0963-0252/24/6/065022},
   keywords = {sputter species density; magnetron; HIPIMS; plasma diagnostics; titanium},
   language = {eng},
   issn = {0963-0252},
   journal = {Plasma Sources Science and Technology},
   title = {Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy},
   url = {http://iopscience.iop.org/article/10.1088/0963-0252/24/6/065022},
   volume = {24},
   year = {2015}
}

TY  - JOUR
ID  - 1318794
AU  - Vašina, Petr - Fekete, Matej - Hnilica, Jaroslav - Klein, Peter - Dosoudilová, Lenka - Dvořák, Pavel - Navrátil, Zdeněk
PY  - 2015
TI  - Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy
JF  - Plasma Sources Science and Technology
VL  - 24
IS  - 6
SP  - "nestránkováno"
EP  - "nestránkováno"
SN  - 09630252
KW  - sputter species density
KW  - magnetron
KW  - HIPIMS
KW  - plasma diagnostics
KW  - titanium
UR  - http://iopscience.iop.org/article/10.1088/0963-0252/24/6/065022
N2  - The thorough characterizations of deposition plasma lead to important achievements in the fundamental understanding of the deposition process, with a clear impact on the development of technology. Measurement of the spatial and, in the case of pulse excited plasma, also temporal evolution, of the concentrations of sputtered atoms and ions is a primary task in the diagnostics of any sputter deposition plasma. However, it is difficult to estimate absolute number densities of the sputtered species (atoms and ions) in ground states directly from optical emission spectroscopy, because the species in the ground levels do not produce any optical signal. A method using effective branching fractions enables us to determine the density of non-radiating species from the intensities of self-absorbed spectral lines. The branching fractions method described in the first part of this paper was applied to determine the ground state densities of the sputtered titanium atoms and ions. The method is based on fitting the theoretically calculated branching fractions to experimentally measured ratios of the relative intensities of carefully selected resonant titanium atomic and ionic lines. The sputtered species density is determined in our experimental setup with a relative uncertainty of less than 5% for the dc driven magnetron and typically 15% for time-resolved measurements of high- power impulse magnetron sputtering (HiPIMS) discharge. In the second part of the paper, the method was applied to determine the evolution of titanium atom and ion densities in three typical cases ranging from the dc driven sputter process to HiPIMS.
ER  -

VAŠINA, Petr, Matej FEKETE, Jaroslav HNILICA, Peter KLEIN, Lenka DOSOUDILOVÁ, Pavel DVOŘÁK and Zdeněk NAVRÁTIL. Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy. \textit{Plasma Sources Science and Technology}. 2015, vol.~24, No~6, p.~''nestránkováno'', 13 pp. ISSN~0963-0252. Available from: https://dx.doi.org/10.1088/0963-0252/24/6/065022.

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