RÁHEĽ, Jozef, Jan ČECH and Tomáš MORÁVEK. Striated Patterns in Coplanar Barrier Discharge. Online. In Jan Čech, Pavel Souček, Dana Skácelová, Jaroslav Hnilica. Potential Application of Plasma and Nanomaterials 2015, Book of Contributed Papers. 1st edition. Brno: Masarykova univerzita, 2015, p. 55-59. ISBN 978-80-210-8053-9.
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Basic information
Original name Striated Patterns in Coplanar Barrier Discharge
Authors RÁHEĽ, Jozef, Jan ČECH and Tomáš MORÁVEK.
Edition 1st edition. Brno, Potential Application of Plasma and Nanomaterials 2015, Book of Contributed Papers, p. 55-59, 5 pp. 2015.
Publisher Masarykova univerzita
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
Publication form electronic version available online
Organization unit Faculty of Science
ISBN 978-80-210-8053-9
Keywords in English dielectric barrier discharge; coplanar; atmospheric pressure; homogeneous; striations
Tags NZ
Changed by Changed by: Ing. Nicole Zrilić, učo 240776. Changed: 17/5/2018 09:39.
Abstract
Atmospheric pressure rare gases of helium, neon and argon were investigated by means of high speed ICCD camera for the presence of striated structures in single pair strips geometry of coplanar dielectric barrier discharge. In helium stratification occurs over the instantaneous anode. In neon two distinct regimes of striation were observed - spatially stable diffuse over the anode, and unstable filamentary over the interelectrode gap and anode. In argon only the filamentary striation regime was observed.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
GA13-24635S, research and development projectName: Spektroskopické studium rekombinace povrchového náboje v dielektrických bariérových výbojích
Investor: Czech Science Foundation
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
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