Detailed Information on Publication Record
2016
Photoelectrocatalytic activity of ZnO coated nano-porous silicon by atomic layer deposition
SAMPATH, Sridhar, Marina SHESTAKOVA, Philipp MAYDANNIK, Tatiana IVANOVA, Tomáš HOMOLA et. al.Basic information
Original name
Photoelectrocatalytic activity of ZnO coated nano-porous silicon by atomic layer deposition
Authors
SAMPATH, Sridhar (356 India), Marina SHESTAKOVA (643 Russian Federation), Philipp MAYDANNIK (643 Russian Federation), Tatiana IVANOVA (643 Russian Federation), Tomáš HOMOLA (703 Slovakia, guarantor, belonging to the institution), Anton BRYUKVIN (643 Russian Federation), Mika SILLANPÄÄ (246 Finland), Rameshbabu NAGUMOTHU (356 India) and Viswanathan ALAGAN (356 India)
Edition
RSC Advances, 2016, 2046-2069
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10302 Condensed matter physics
Country of publisher
United Kingdom of Great Britain and Northern Ireland
Confidentiality degree
není předmětem státního či obchodního tajemství
References:
Impact factor
Impact factor: 3.108
RIV identification code
RIV/00216224:14310/16:00089526
Organization unit
Faculty of Science
UT WoS
000372252700043
Keywords in English
N/A
Změněno: 27/2/2018 14:13, doc. RNDr. Tomáš Homola, PhD.
Abstract
V originále
In the present study, ZnO thin film was grown on nano-porous silicon by atomic layer deposition (ALD) whereas porous silicon was prepared by a stain etching method for three different durations, 4 min (PS1), 8 min (PS2) and 12 min (PS3). SEM analysis shows that ZnO nanoparticles with a size of 20–50 nm were uniformly distributed on nano-porous silicon. AFM analysis shows that the surface roughness of the nanoporous silicon increases continuously with the increase of porous silicon etching time. In contradiction, the surface roughness is almost equal for ZnO/PS1, ZnO/PS2 and ZnO/PS3. XRD analysis shows that the ZnO nanoparticles exhibited a hexagonal wurtzite structure. XPS characterization was used to analyze the chemical composition and states present in the ZnO coated porous silicon. The DRS UV-Visible absorbance spectrum reveals that ZnO/PS3 very strongly absorbs visible light around 526 nm. ZnO coated porous silicon, especially ZnO/PS3, exhibited higher photocatalytic activity compared to ZnO coated glass towards methylene blue dye degradation. Likewise, the negative biased ZnO/PS3 exhibited superior photocatalytic activity compared to unbiased and positive biased ZnO/PS3. The enhanced solar photocatalytic and photoelectrocatalytic activity is attributed to the visible light absorption of ZnO/PS and the effective injection of photogenerated electrons from porous silicon to ZnO even if porous silicon is not directly involved in any redox reactions.
Links
ED2.1.00/03.0086, research and development project |
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LO1411, research and development project |
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