J 2016

Photoelectrocatalytic activity of ZnO coated nano-porous silicon by atomic layer deposition

SAMPATH, Sridhar, Marina SHESTAKOVA, Philipp MAYDANNIK, Tatiana IVANOVA, Tomáš HOMOLA et. al.

Basic information

Original name

Photoelectrocatalytic activity of ZnO coated nano-porous silicon by atomic layer deposition

Authors

SAMPATH, Sridhar (356 India), Marina SHESTAKOVA (643 Russian Federation), Philipp MAYDANNIK (643 Russian Federation), Tatiana IVANOVA (643 Russian Federation), Tomáš HOMOLA (703 Slovakia, guarantor, belonging to the institution), Anton BRYUKVIN (643 Russian Federation), Mika SILLANPÄÄ (246 Finland), Rameshbabu NAGUMOTHU (356 India) and Viswanathan ALAGAN (356 India)

Edition

RSC Advances, 2016, 2046-2069

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10302 Condensed matter physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

Impact factor

Impact factor: 3.108

RIV identification code

RIV/00216224:14310/16:00089526

Organization unit

Faculty of Science

UT WoS

000372252700043

Keywords in English

N/A

Tags

Změněno: 27/2/2018 14:13, doc. RNDr. Tomáš Homola, PhD.

Abstract

V originále

In the present study, ZnO thin film was grown on nano-porous silicon by atomic layer deposition (ALD) whereas porous silicon was prepared by a stain etching method for three different durations, 4 min (PS1), 8 min (PS2) and 12 min (PS3). SEM analysis shows that ZnO nanoparticles with a size of 20–50 nm were uniformly distributed on nano-porous silicon. AFM analysis shows that the surface roughness of the nanoporous silicon increases continuously with the increase of porous silicon etching time. In contradiction, the surface roughness is almost equal for ZnO/PS1, ZnO/PS2 and ZnO/PS3. XRD analysis shows that the ZnO nanoparticles exhibited a hexagonal wurtzite structure. XPS characterization was used to analyze the chemical composition and states present in the ZnO coated porous silicon. The DRS UV-Visible absorbance spectrum reveals that ZnO/PS3 very strongly absorbs visible light around 526 nm. ZnO coated porous silicon, especially ZnO/PS3, exhibited higher photocatalytic activity compared to ZnO coated glass towards methylene blue dye degradation. Likewise, the negative biased ZnO/PS3 exhibited superior photocatalytic activity compared to unbiased and positive biased ZnO/PS3. The enhanced solar photocatalytic and photoelectrocatalytic activity is attributed to the visible light absorption of ZnO/PS and the effective injection of photogenerated electrons from porous silicon to ZnO even if porous silicon is not directly involved in any redox reactions.

Links

ED2.1.00/03.0086, research and development project
Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
LO1411, research and development project
Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR