SAMPATH, Sridhar, Marina SHESTAKOVA, Philipp MAYDANNIK, Tatiana IVANOVA, Tomáš HOMOLA, Anton BRYUKVIN, Mika SILLANPÄÄ, Rameshbabu NAGUMOTHU and Viswanathan ALAGAN. Photoelectrocatalytic activity of ZnO coated nano-porous silicon by atomic layer deposition. RSC Advances. vol. 6, No 30, p. 25173-25178. ISSN 2046-2069. doi:10.1039/C6RA01655C. 2016.
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Basic information
Original name Photoelectrocatalytic activity of ZnO coated nano-porous silicon by atomic layer deposition
Authors SAMPATH, Sridhar (356 India), Marina SHESTAKOVA (643 Russian Federation), Philipp MAYDANNIK (643 Russian Federation), Tatiana IVANOVA (643 Russian Federation), Tomáš HOMOLA (703 Slovakia, guarantor, belonging to the institution), Anton BRYUKVIN (643 Russian Federation), Mika SILLANPÄÄ (246 Finland), Rameshbabu NAGUMOTHU (356 India) and Viswanathan ALAGAN (356 India).
Edition RSC Advances, 2016, 2046-2069.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10302 Condensed matter physics
Country of publisher United Kingdom of Great Britain and Northern Ireland
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 3.108
RIV identification code RIV/00216224:14310/16:00089526
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1039/C6RA01655C
UT WoS 000372252700043
Keywords in English N/A
Tags AKR, rivok
Changed by Changed by: doc. RNDr. Tomáš Homola, PhD., učo 119468. Changed: 27/2/2018 14:13.
Abstract
In the present study, ZnO thin film was grown on nano-porous silicon by atomic layer deposition (ALD) whereas porous silicon was prepared by a stain etching method for three different durations, 4 min (PS1), 8 min (PS2) and 12 min (PS3). SEM analysis shows that ZnO nanoparticles with a size of 20–50 nm were uniformly distributed on nano-porous silicon. AFM analysis shows that the surface roughness of the nanoporous silicon increases continuously with the increase of porous silicon etching time. In contradiction, the surface roughness is almost equal for ZnO/PS1, ZnO/PS2 and ZnO/PS3. XRD analysis shows that the ZnO nanoparticles exhibited a hexagonal wurtzite structure. XPS characterization was used to analyze the chemical composition and states present in the ZnO coated porous silicon. The DRS UV-Visible absorbance spectrum reveals that ZnO/PS3 very strongly absorbs visible light around 526 nm. ZnO coated porous silicon, especially ZnO/PS3, exhibited higher photocatalytic activity compared to ZnO coated glass towards methylene blue dye degradation. Likewise, the negative biased ZnO/PS3 exhibited superior photocatalytic activity compared to unbiased and positive biased ZnO/PS3. The enhanced solar photocatalytic and photoelectrocatalytic activity is attributed to the visible light absorption of ZnO/PS and the effective injection of photogenerated electrons from porous silicon to ZnO even if porous silicon is not directly involved in any redox reactions.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
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