MORÁVEK, Tomáš, Jan ČECH, Zdeněk NAVRÁTIL and Jozef RÁHEĽ. Pre-breakdown phase of coplanar dielectric barrier discharge in helium. The European Physical Journal Applied Physics. 2016, vol. 75, No 2, p. "nestrankovano", 5 pp. ISSN 1286-0042. Available from: https://dx.doi.org/10.1051/epjap/2016150538.
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Basic information
Original name Pre-breakdown phase of coplanar dielectric barrier discharge in helium
Authors MORÁVEK, Tomáš (703 Slovakia, guarantor, belonging to the institution), Jan ČECH (203 Czech Republic, belonging to the institution), Zdeněk NAVRÁTIL (203 Czech Republic, belonging to the institution) and Jozef RÁHEĽ (703 Slovakia, belonging to the institution).
Edition The European Physical Journal Applied Physics, 2016, 1286-0042.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher France
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 0.684
RIV identification code RIV/00216224:14310/16:00087884
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1051/epjap/2016150538
UT WoS 000380828500006
Keywords in English coplanar DBD; discharge formation; helium
Tags AKR, rivok
Tags International impact, Reviewed
Changed by Changed by: doc. Mgr. Zdeněk Navrátil, Ph.D., učo 3323. Changed: 13/3/2018 11:01.
Abstract
Coplanar barrier discharge in single-pair electrode configuration was used to study the formation of helium diffuse mode discharge. Transition from Townsend avalanching to the cathode and anode directed ionization waves was documented by high-speed camera imaging. When alumina dielectric barrier was coated by a thin layer of high permittivity coating (epsilon_r = 120–140), a new partial discharge preceding the Townsend avalanching phase was clearly visible. We suggest that this new pre-Townsend breakdown event is analogous to the known backward discharge of surface barrier discharge. Low magnitude of local electric field strength during the pre-Townsend breakdown reduces the number of competing electron collision excitation processes. This opens a new opportunity for studying optical emission from surface charge recombination processes.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
GA13-24635S, research and development projectName: Spektroskopické studium rekombinace povrchového náboje v dielektrických bariérových výbojích
Investor: Czech Science Foundation
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
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