J 2016

Pre-breakdown phase of coplanar dielectric barrier discharge in helium

MORÁVEK, Tomáš, Jan ČECH, Zdeněk NAVRÁTIL and Jozef RÁHEĽ

Basic information

Original name

Pre-breakdown phase of coplanar dielectric barrier discharge in helium

Authors

MORÁVEK, Tomáš (703 Slovakia, guarantor, belonging to the institution), Jan ČECH (203 Czech Republic, belonging to the institution), Zdeněk NAVRÁTIL (203 Czech Republic, belonging to the institution) and Jozef RÁHEĽ (703 Slovakia, belonging to the institution)

Edition

The European Physical Journal Applied Physics, 2016, 1286-0042

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

France

Confidentiality degree

není předmětem státního či obchodního tajemství

Impact factor

Impact factor: 0.684

RIV identification code

RIV/00216224:14310/16:00087884

Organization unit

Faculty of Science

DOI

http://dx.doi.org/10.1051/epjap/2016150538

UT WoS

000380828500006

Keywords in English

coplanar DBD; discharge formation; helium

Tags

AKR, rivok

Tags

International impact, Reviewed
Změněno: 13/3/2018 11:01, doc. Mgr. Zdeněk Navrátil, Ph.D.

Abstract

V originále

Coplanar barrier discharge in single-pair electrode configuration was used to study the formation of helium diffuse mode discharge. Transition from Townsend avalanching to the cathode and anode directed ionization waves was documented by high-speed camera imaging. When alumina dielectric barrier was coated by a thin layer of high permittivity coating (epsilon_r = 120–140), a new partial discharge preceding the Townsend avalanching phase was clearly visible. We suggest that this new pre-Townsend breakdown event is analogous to the known backward discharge of surface barrier discharge. Low magnitude of local electric field strength during the pre-Townsend breakdown reduces the number of competing electron collision excitation processes. This opens a new opportunity for studying optical emission from surface charge recombination processes.

Links

ED2.1.00/03.0086, research and development project
Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
GA13-24635S, research and development project
Name: Spektroskopické studium rekombinace povrchového náboje v dielektrických bariérových výbojích
Investor: Czech Science Foundation
LO1411, research and development project
Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
Displayed: 16/11/2024 16:33