MAZÁNKOVÁ, Věra, David TRUNEC, Zdeněk NAVRÁTIL, Jüri RAUD and František KRČMA. Study of argon–oxygen flowing afterglow. Plasma Sources Science and Technology. IOP Publishing, 2016, vol. 25, No 3, p. "nestrankovano", 10 pp. ISSN 0963-0252. Available from: https://dx.doi.org/10.1088/0963-0252/25/3/035008.
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Basic information
Original name Study of argon–oxygen flowing afterglow
Name in Czech Studium proudícího dohasínání v argonu s kyslíkem
Authors MAZÁNKOVÁ, Věra (203 Czech Republic), David TRUNEC (203 Czech Republic, guarantor, belonging to the institution), Zdeněk NAVRÁTIL (203 Czech Republic, belonging to the institution), Jüri RAUD (233 Estonia, belonging to the institution) and František KRČMA (203 Czech Republic).
Edition Plasma Sources Science and Technology, IOP Publishing, 2016, 0963-0252.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher United Kingdom of Great Britain and Northern Ireland
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 3.302
RIV identification code RIV/00216224:14310/16:00089811
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1088/0963-0252/25/3/035008
UT WoS 000376557400016
Keywords (in Czech) dohasínání; argon; kyslík
Keywords in English flowing afterglow; argon; oxygen
Tags AKR, rivok
Tags International impact, Reviewed
Changed by Changed by: doc. Mgr. Zdeněk Navrátil, Ph.D., učo 3323. Changed: 13/3/2018 11:01.
Abstract
The reaction kinetics in argon–oxygen flowing afterglow(post-discharge) was studied using NO titration and optical emission spectroscopy.
Abstract (in Czech)
Kinetika reakcí v dohasínaní v argonu s přídavkem kyslíku byla studována pomocí NO titrace a optické emisní spektroskopie.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
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