J 2016

Efficient solar photocatalytic activity of TiO2 coated nano-porous silicon by atomic layer deposition

SAMPATH, Sridhar, Philipp MAYDANNIK, Tatiana IVANOVA, Marina SHESTAKOVA, Tomáš HOMOLA et. al.

Basic information

Original name

Efficient solar photocatalytic activity of TiO2 coated nano-porous silicon by atomic layer deposition

Authors

SAMPATH, Sridhar (356 India, guarantor), Philipp MAYDANNIK (643 Russian Federation), Tatiana IVANOVA (643 Russian Federation), Marina SHESTAKOVA (643 Russian Federation), Tomáš HOMOLA (703 Slovakia, belonging to the institution), Anton BRYUKVIN (643 Russian Federation), Mika SILLANPÄÄ (246 Finland), Rameshbabu NAGUMOTHU (356 India) and Viswanathan ALAGAN (356 India)

Edition

Superlattices and Microstructures, 2016, 0749-6036

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

http://www.sciencedirect.com/science/article/pii/S0749603616302567

Impact factor

Impact factor: 2.123

RIV identification code

RIV/00216224:14310/16:00090205

Organization unit

Faculty of Science

DOI

http://dx.doi.org/10.1016/j.spmi.2016.06.004

UT WoS

000385319200017

Keywords in English

Porous silicon;TiO2;Stain etching;ALD;Layer by layer solar absorption

Tags

AKR, rivok
Změněno: 5/4/2017 11:31, Ing. Andrea Mikešková

Abstract

V originále

In the present study, TiO2 coated nano-porous silicon (TiO2/PS) was prepared by atomic layer deposition (ALD) whereas porous silicon was prepared by stain etching method for efficient solar photocatalytic activity. TiO2/PS was characterized by FESEM, AFM, XRD, XPS and DRS UV–vis spectrophotometer. Absorbance spectrum revealed that TiO2/PS absorbs complete solar light with wave length range of 300 nm–800 nm and most importantly, it absorbs stronger visible light than UV light.

Links

ED2.1.00/03.0086, research and development project
Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
LO1411, research and development project
Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
Displayed: 1/11/2024 08:39