ČECH, Jan, Jozef RÁHEĽ, Zsolt SZALAY and Tomáš MORÁVEK. Residual heat contribution to the memory effect of DBD microdischarges: numerical and experimental study. In V. Medvecká, P. Papp, J. Országh, Š. Matejčík. Proceedings of the 23rd  Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases, Bratislava, Slovakia, 12‐16 July 2016. 1st ed. Bratislava: European Physical Society, 2016, p. 102-103. ISBN 979-1-09-638902-5.
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Basic information
Original name Residual heat contribution to the memory effect of DBD microdischarges: numerical and experimental study
Authors ČECH, Jan, Jozef RÁHEĽ, Zsolt SZALAY and Tomáš MORÁVEK.
Edition 1. vyd. Bratislava, Proceedings of the 23rd  Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases, Bratislava, Slovakia, 12‐16 July 2016. p. 102-103, 2 pp. 2016.
Publisher European Physical Society
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Slovakia
Confidentiality degree is not subject to a state or trade secret
Publication form storage medium (CD, DVD, flash disk)
Organization unit Faculty of Science
ISBN 979-1-09-638902-5
Keywords in English DBD; coplanar DBD; residual heat build up
Tags NZ
Changed by Changed by: Ing. Nicole Zrilić, učo 240776. Changed: 16/5/2018 16:19.
Abstract
The behaviour of individual microdischarges of dielectric barrier discharges is known to be influenced by so-called memory effect, i.e., the contribution of remnant active species and charges in the discharge area to the formation of a new microdischarge. In presented contribution the model of memory effect is supplemented by the discussion of residual heat build-up contribution with respect to the spatial stabilization of the train of successive microdischarges.
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ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
GA13-24635S, research and development projectName: Spektroskopické studium rekombinace povrchového náboje v dielektrických bariérových výbojích
Investor: Czech Science Foundation
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
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