J 2016

Principles and practice of an automatic process control for the deposition of hard nc-TiC/a-C:H coatings by hybrid PVD-PECVD under industrial conditions

ŽEMLIČKA, Radek, Mojmír JÍLEK, Petr VOGL, Jaroslav ŠRÁMEK, Pavel SOUČEK et. al.

Basic information

Original name

Principles and practice of an automatic process control for the deposition of hard nc-TiC/a-C:H coatings by hybrid PVD-PECVD under industrial conditions

Authors

ŽEMLIČKA, Radek (203 Czech Republic, belonging to the institution), Mojmír JÍLEK (203 Czech Republic), Petr VOGL (203 Czech Republic), Jaroslav ŠRÁMEK (203 Czech Republic), Pavel SOUČEK (203 Czech Republic, belonging to the institution), Vilma BURŠÍKOVÁ (203 Czech Republic, belonging to the institution) and Petr VAŠINA (203 Czech Republic, guarantor, belonging to the institution)

Edition

Surface & coatings technology, Elsevier, 2016, 0257-8972

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Switzerland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

Impact factor

Impact factor: 2.589

RIV identification code

RIV/00216224:14310/16:00088074

Organization unit

Faculty of Science

UT WoS

000384775900002

Keywords in English

Nanocomposites; Magnetron sputtering; Process control; Mechanical properties; Titanium-carbon coatings; DLC; Industrial process

Tags

Tags

International impact, Reviewed
Změněno: 15/3/2018 09:58, doc. RNDr. Vilma Buršíková, Ph.D.

Abstract

V originále

A study of a hybrid PVD-PECVD process of sputtering a titanium target in an argon/acetylene gas mixture was performed. This process was used for the deposition of nanocomposite coatings consisting of titanium carbide grains embedded in an amorphous hydrogenated carbon matrix (nc-TiC/a-C:H). The study was performed under industrial conditions employing a large-scale deposition device with a cylindrical sputtering cathode. When the acetylene supply was gradually increased, a discharge voltage drop and total pressure saturation simultaneously occurred at a certain acetylene supply. The hardest coatings were found always to be deposited at the acetylene supply corresponding to these deposition conditions. However, the acetylene supply to detect the voltage drop and pressure saturation was determined to be dependent on the cathode thickness. A fully automatic procedure suitable for the preparation of hard nc-TiC/a-C:H coatings by the hybrid PVD-PECVD process was proposed in this paper. This approach ensured that the optimal deposition setting was consistently found for the deposition process independent of the cathode thickness. The procedure was thoroughly tested, and it was demonstrated to be reliable and robust. Furthermore, the algorithm ensured the deposition of coatings with the same composition and the same high hardness throughout the cathode lifetime.

Links

ED2.1.00/03.0086, research and development project
Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
GAP205/12/0407, research and development project
Name: Porozumění hybridnímu PVD-PECVD procesu s cílem řídit růst nanostrukturovaných kompozitních vrstev
Investor: Czech Science Foundation
LO1411, research and development project
Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR