Detailed Information on Publication Record
2016
Structural and morphological characterization of Al2O3 coated macro-porous silicon by atomic layer deposition
SAMPATH, Sridhar, Philipp MAYDANNIK, Tatiana IVANOVA, Tomáš HOMOLA, Mika SILLANPAA et. al.Basic information
Original name
Structural and morphological characterization of Al2O3 coated macro-porous silicon by atomic layer deposition
Authors
SAMPATH, Sridhar (356 India, guarantor), Philipp MAYDANNIK (643 Russian Federation), Tatiana IVANOVA (643 Russian Federation), Tomáš HOMOLA (703 Slovakia, belonging to the institution), Mika SILLANPAA (246 Finland), Rameshbabu NAGUMOTHU (356 India) and Viswanathan ALAGAN (356 India)
Edition
Thin Solid Films, 2016, 0040-6090
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10305 Fluids and plasma physics
Country of publisher
Switzerland
Confidentiality degree
není předmětem státního či obchodního tajemství
References:
Impact factor
Impact factor: 1.879
RIV identification code
RIV/00216224:14310/16:00090987
Organization unit
Faculty of Science
UT WoS
000389388600089
Keywords in English
Electrochemical anodization;Atomic layer deposition;Porous silicon;Conformal coating;Band gap energy
Změněno: 13/4/2017 23:06, Ing. Andrea Mikešková
Abstract
V originále
In the present study, Al2O3 coated on macro-porous silicon (m-PS) is prepared by atomic layer deposition (ALD) whereas m-PS is prepared by electrochemical anodization of P type silicon (100) with current density of 15 mA/cm2. Field emission scanning electron microscopy analysis shows Al2O3 nanoparticles with size of ~ 100 nm are conformally coated on m-PS. The surface chemistry and formation mechanism of ALD of Al2O3 (ALD-Al2O3) on m-PS are demonstrated in detail. Optical profilometer results of Al2O3/m-PS confirm conformality of Al2O3 coating on m-PS because the surface amplitude parameter values of m-PS are decreased after ALD-Al2O3. Fourier Transform Infrared analysis confirms that unstable Si-H species of m-PS are replaced with stable Si-Al species. X-ray photoelectron spectroscopy (XPS) analysis of Al2O3/m-PS is carried out for chemical analysis and band gap energy measurement of Al2O3. The XPS survey spectrum shows that fluorine peak is also evolved along with Al, O and C elements which confirm that m-PS surface consists of fluorine. The band gap energy of Al2O3 coating is calculated as 6.91 eV from analysis of high resolution O 1s spectrum.
Links
ED2.1.00/03.0086, research and development project |
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LO1411, research and development project |
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