J 2016

Structural and morphological characterization of Al2O3 coated macro-porous silicon by atomic layer deposition

SAMPATH, Sridhar, Philipp MAYDANNIK, Tatiana IVANOVA, Tomáš HOMOLA, Mika SILLANPAA et. al.

Basic information

Original name

Structural and morphological characterization of Al2O3 coated macro-porous silicon by atomic layer deposition

Authors

SAMPATH, Sridhar (356 India, guarantor), Philipp MAYDANNIK (643 Russian Federation), Tatiana IVANOVA (643 Russian Federation), Tomáš HOMOLA (703 Slovakia, belonging to the institution), Mika SILLANPAA (246 Finland), Rameshbabu NAGUMOTHU (356 India) and Viswanathan ALAGAN (356 India)

Edition

Thin Solid Films, 2016, 0040-6090

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Switzerland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

Impact factor

Impact factor: 1.879

RIV identification code

RIV/00216224:14310/16:00090987

Organization unit

Faculty of Science

UT WoS

000389388600089

Keywords in English

Electrochemical anodization;Atomic layer deposition;Porous silicon;Conformal coating;Band gap energy

Tags

Změněno: 13/4/2017 23:06, Ing. Andrea Mikešková

Abstract

V originále

In the present study, Al2O3 coated on macro-porous silicon (m-PS) is prepared by atomic layer deposition (ALD) whereas m-PS is prepared by electrochemical anodization of P type silicon (100) with current density of 15 mA/cm2. Field emission scanning electron microscopy analysis shows Al2O3 nanoparticles with size of ~ 100 nm are conformally coated on m-PS. The surface chemistry and formation mechanism of ALD of Al2O3 (ALD-Al2O3) on m-PS are demonstrated in detail. Optical profilometer results of Al2O3/m-PS confirm conformality of Al2O3 coating on m-PS because the surface amplitude parameter values of m-PS are decreased after ALD-Al2O3. Fourier Transform Infrared analysis confirms that unstable Si-H species of m-PS are replaced with stable Si-Al species. X-ray photoelectron spectroscopy (XPS) analysis of Al2O3/m-PS is carried out for chemical analysis and band gap energy measurement of Al2O3. The XPS survey spectrum shows that fluorine peak is also evolved along with Al, O and C elements which confirm that m-PS surface consists of fluorine. The band gap energy of Al2O3 coating is calculated as 6.91 eV from analysis of high resolution O 1s spectrum.

Links

ED2.1.00/03.0086, research and development project
Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
LO1411, research and development project
Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR