MRKVIČKOVÁ, Martina, Jozef RÁHEĽ, Pavel DVOŘÁK, David TRUNEC and Tomáš MORÁVEK. TALIF MEASUREMENT OF ATOMIC HYDROGEN DENSITIES IN A COPLANAR SURFACE DIELECTRIC BARRIER DISCHARGE. In Mirko Černák, Tomáš Hoder. Hakone XV: International Symposium of High Pressure Low Temperature Plasma Chemistry. Brno: Masaryk University. p. 130-133. ISBN 978-80-210-8318-9. 2016.
Other formats:   BibTeX LaTeX RIS
Basic information
Original name TALIF MEASUREMENT OF ATOMIC HYDROGEN DENSITIES IN A COPLANAR SURFACE DIELECTRIC BARRIER DISCHARGE
Authors MRKVIČKOVÁ, Martina (203 Czech Republic, belonging to the institution), Jozef RÁHEĽ (703 Slovakia, guarantor, belonging to the institution), Pavel DVOŘÁK (203 Czech Republic, belonging to the institution), David TRUNEC (203 Czech Republic, belonging to the institution) and Tomáš MORÁVEK (703 Slovakia, belonging to the institution).
Edition Brno, Hakone XV: International Symposium of High Pressure Low Temperature Plasma Chemistry, p. 130-133, 4 pp. 2016.
Publisher Masaryk University
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
Publication form printed version "print"
RIV identification code RIV/00216224:14310/16:00088224
Organization unit Faculty of Science
ISBN 978-80-210-8318-9
UT WoS 000393033200027
Keywords in English TALIF; surface DBD; atomic hydrogen
Tags AKR, rivok
Tags International impact, Reviewed
Changed by Changed by: Ing. Andrea Mikešková, učo 137293. Changed: 26/4/2017 22:21.
Abstract
The difficulties of employing two-photon absorption laser induced fluorescence (TALIF) technique for determination of atomic concentrations in close proximity of dielectric surface was successfully addressed. We present our experience from measurement of atomic hydrogen concentration in a coplanar surface dielectric barrier discharge.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
GA13-24635S, research and development projectName: Spektroskopické studium rekombinace povrchového náboje v dielektrických bariérových výbojích
Investor: Czech Science Foundation
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
7AMB14SK204, research and development projectName: Studium nerovnovážného difúzního plazmatu generovaného ve vodních parách za atmosférického tlaku optickými a laserovými metodami (Acronym: LIFOH)
Investor: Ministry of Education, Youth and Sports of the CR
PrintDisplayed: 29/3/2024 02:24