TALIF MEASUREMENT OF ATOMIC HYDROGEN DENSITIES IN A COPLANAR SURFACE DIELECTRIC BARRIER DISCHARGE

MRKVIČKOVÁ, Martina, Jozef RÁHEĽ, Pavel DVOŘÁK, David TRUNEC and Tomáš MORÁVEK. TALIF MEASUREMENT OF ATOMIC HYDROGEN DENSITIES IN A COPLANAR SURFACE DIELECTRIC BARRIER DISCHARGE. In Mirko Černák, Tomáš Hoder. Hakone XV: International Symposium of High Pressure Low Temperature Plasma Chemistry. Brno: Masaryk University, 2016, p. 130-133. ISBN 978-80-210-8318-9.

Basic information

Original name

TALIF MEASUREMENT OF ATOMIC HYDROGEN DENSITIES IN A COPLANAR SURFACE DIELECTRIC BARRIER DISCHARGE

Authors

MRKVIČKOVÁ, Martina (203 Czech Republic, belonging to the institution), Jozef RÁHEĽ (703 Slovakia, guarantor, belonging to the institution), Pavel DVOŘÁK (203 Czech Republic, belonging to the institution), David TRUNEC (203 Czech Republic, belonging to the institution) and Tomáš MORÁVEK (703 Slovakia, belonging to the institution)

Edition

Brno, Hakone XV: International Symposium of High Pressure Low Temperature Plasma Chemistry, p. 130-133, 4 pp. 2016

Publisher

Masaryk University

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Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Czech Republic

Confidentiality degree

není předmětem státního či obchodního tajemství

Publication form

printed version "print"

RIV identification code

RIV/00216224:14310/16:00088224

Organization unit

Faculty of Science

ISBN

978-80-210-8318-9

UT WoS

000393033200027

Keywords in English

TALIF; surface DBD; atomic hydrogen

Tags

AKR, rivok

Tags

International impact, Reviewed

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Abstract

V originále

The difficulties of employing two-photon absorption laser induced fluorescence (TALIF) technique for determination of atomic concentrations in close proximity of dielectric surface was successfully addressed. We present our experience from measurement of atomic hydrogen concentration in a coplanar surface dielectric barrier discharge.

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Links

ED2.1.00/03.0086, research and development project	Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
GA13-24635S, research and development project	Name: Spektroskopické studium rekombinace povrchového náboje v dielektrických bariérových výbojích Investor: Czech Science Foundation
LO1411, research and development project	Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus) Investor: Ministry of Education, Youth and Sports of the CR
7AMB14SK204, research and development project	Name: Studium nerovnovážného difúzního plazmatu generovaného ve vodních parách za atmosférického tlaku optickými a laserovými metodami (Acronym: LIFOH) Investor: Ministry of Education, Youth and Sports of the CR