GALMIZ, Oleksandr, Antonín BRABLEC and Vít KUDRLE. Deposition of thin zinc films by atmospheric pressure plasma jet in aqueous media. In Mirko Cernak, Tomas Hoder. Hakone XV: International Symposium of High Pressure low Temperature Plasma Chemistry. Brno: Masaryk University, 2016, p. 279-282. ISBN 978-80-210-8318-9.
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Basic information
Original name Deposition of thin zinc films by atmospheric pressure plasma jet in aqueous media
Authors GALMIZ, Oleksandr (804 Ukraine, belonging to the institution), Antonín BRABLEC (203 Czech Republic, guarantor, belonging to the institution) and Vít KUDRLE (203 Czech Republic, belonging to the institution).
Edition Brno, Hakone XV: International Symposium of High Pressure low Temperature Plasma Chemistry, p. 279-282, 4 pp. 2016.
Publisher Masaryk University
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
Publication form printed version "print"
RIV identification code RIV/00216224:14310/16:00091359
Organization unit Faculty of Science
ISBN 978-80-210-8318-9
UT WoS 000393033200065
Keywords in English atmospheric plasma jet; thin film deposition; zinc
Tags AKR, rivok
Tags International impact, Reviewed
Changed by Changed by: Ing. Andrea Mikešková, učo 137293. Changed: 26/4/2017 22:37.
Abstract
Argon plasma jet was operated at atmospheric pressure in contact with aqueous solution of a zinc salt in order to deposit thin films on silicon substrates immersed in the liquid. The thickness of the films was determined by a profilometer while the chemical composition was analysed by XPS technique. The experiments revealed the importance of the submersion depth of the substrate which strongly affects the energy and particle influx.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
PrintDisplayed: 5/5/2024 00:33