ČECH, Jan, Pavel SŤAHEL, Miroslav ZEMÁNEK and Zdeněk BONAVENTURA. WIDE-PRESSURE-RANGE COPLANAR BARRIER DISCHARGE. In Mirko Černák, Tomáš Hoder. Hakone XV: International Symposium on High Pressure Low Temperature Plasma Chemistrywith joint COST TD1208 workshop Non-Equilibrium Plasmas with Liquids for Water and Surface Treatment. Book of Contributed Papers. Brno: Masarykova univerzita; Jednota českých matematiků a fyziků, 2016, p. 144-147. ISBN 978-80-210-8318-9.
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Basic information
Original name WIDE-PRESSURE-RANGE COPLANAR BARRIER DISCHARGE
Authors ČECH, Jan (203 Czech Republic, guarantor, belonging to the institution), Pavel SŤAHEL (203 Czech Republic, belonging to the institution), Miroslav ZEMÁNEK (203 Czech Republic, belonging to the institution) and Zdeněk BONAVENTURA (203 Czech Republic, belonging to the institution).
Edition Brno, Hakone XV: International Symposium on High Pressure Low Temperature Plasma Chemistrywith joint COST TD1208 workshop Non-Equilibrium Plasmas with Liquids for Water and Surface Treatment. Book of Contributed Papers, p. 144-147, 4 pp. 2016.
Publisher Masarykova univerzita; Jednota českých matematiků a fyziků
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
Publication form printed version "print"
WWW URL
RIV identification code RIV/00216224:14310/16:00091428
Organization unit Faculty of Science
ISBN 978-80-210-8318-9
UT WoS 000393033200031
Keywords in English plasma source; dielectric barrier discharge; coplanar; atmospheric pressure; low pressure
Tags AKR, rivok
Tags International impact, Reviewed
Changed by Changed by: Ing. Andrea Mikešková, učo 137293. Changed: 26/4/2017 22:42.
Abstract
Single plasma source for wide-pressure-range applications was invented based on dielectric barrier discharge in coplanar geometry. In this paper the basic properties of this plasma source as well as the plasma parameters are presented for the working gas continuous pressure range from 10^1 Pa to 10^5 Pa. The current and voltage waveforms, discharge geometry and emission intensity are presented together with intended application.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
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