D 2016

WIDE-PRESSURE-RANGE COPLANAR BARRIER DISCHARGE

ČECH, Jan, Pavel SŤAHEL, Miroslav ZEMÁNEK and Zdeněk BONAVENTURA

Basic information

Original name

WIDE-PRESSURE-RANGE COPLANAR BARRIER DISCHARGE

Authors

ČECH, Jan (203 Czech Republic, guarantor, belonging to the institution), Pavel SŤAHEL (203 Czech Republic, belonging to the institution), Miroslav ZEMÁNEK (203 Czech Republic, belonging to the institution) and Zdeněk BONAVENTURA (203 Czech Republic, belonging to the institution)

Edition

Brno, Hakone XV: International Symposium on High Pressure Low Temperature Plasma Chemistrywith joint COST TD1208 workshop Non-Equilibrium Plasmas with Liquids for Water and Surface Treatment. Book of Contributed Papers, p. 144-147, 4 pp. 2016

Publisher

Masarykova univerzita; Jednota českých matematiků a fyziků

Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Czech Republic

Confidentiality degree

není předmětem státního či obchodního tajemství

Publication form

printed version "print"

References:

RIV identification code

RIV/00216224:14310/16:00091428

Organization unit

Faculty of Science

ISBN

978-80-210-8318-9

UT WoS

000393033200031

Keywords in English

plasma source; dielectric barrier discharge; coplanar; atmospheric pressure; low pressure

Tags

Tags

International impact, Reviewed
Změněno: 26/4/2017 22:42, Ing. Andrea Mikešková

Abstract

V originále

Single plasma source for wide-pressure-range applications was invented based on dielectric barrier discharge in coplanar geometry. In this paper the basic properties of this plasma source as well as the plasma parameters are presented for the working gas continuous pressure range from 10^1 Pa to 10^5 Pa. The current and voltage waveforms, discharge geometry and emission intensity are presented together with intended application.

Links

ED2.1.00/03.0086, research and development project
Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
LO1411, research and development project
Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR