| KRUMPOLEC, Richard, David Campbell CAMERON, Tomáš HOMOLA and Mirko ČERNÁK. Surface chemistry and initial growth of Al2O3 on plasma modified PTFE studied by ALD. Surfaces and Interfaces. Amsterdam: Elsevier Science, 2017, vol. 6, March, p. 223-228. ISSN 2468-0230. Available from: https://dx.doi.org/10.1016/j.surfin.2016.10.005. |
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@article{1364697,
author = {Krumpolec, Richard and Cameron, David Campbell and Homola, Tomáš and Černák, Mirko},
article_location = {Amsterdam},
article_number = {March},
doi = {http://dx.doi.org/10.1016/j.surfin.2016.10.005},
keywords = {Atomic layer deposition; Nucleation; Plasma pre-treatment; Diffuse coplanar surface barrier discharge; PTFE},
language = {eng},
issn = {2468-0230},
journal = {Surfaces and Interfaces},
title = {Surface chemistry and initial growth of Al2O3 on plasma modified PTFE studied by ALD},
url = {http://www.sciencedirect.com/science/article/pii/S2468023016300529},
volume = {6},
year = {2017}
}
TY - JOUR
ID - 1364697
AU - Krumpolec, Richard - Cameron, David Campbell - Homola, Tomáš - Černák, Mirko
PY - 2017
TI - Surface chemistry and initial growth of Al2O3 on plasma modified PTFE studied by ALD
JF - Surfaces and Interfaces
VL - 6
IS - March
SP - 223-228
EP - 223-228
PB - Elsevier Science
SN - 24680230
KW - Atomic layer deposition
KW - Nucleation
KW - Plasma pre-treatment
KW - Diffuse coplanar surface barrier discharge
KW - PTFE
UR - http://www.sciencedirect.com/science/article/pii/S2468023016300529
L2 - http://www.sciencedirect.com/science/article/pii/S2468023016300529
N2 - An atmospheric-pressure DCSBD plasma in ambient air was used to clean and activate PTFE surfaces before low-temperature atomic layer deposition of Al2O3. It emerged that the fastest nucleation, leading to complete Al2O3 films, took place on PTFE samples that had been treated by plasma that led to the highest concentration of oxygen-containing functional groups. This condition required that some carbon contamination remained on the surface. Complete removal of surface carbon contamination to leave a surface close to stoichiometric PTFE was not beneficial from a film nucleation point of view, due to its lack of active nucleation sites. The results show that DCSBD treatment of PTFE in ambient air is an effective method of controlling and enhancing the nucleation process of thin films deposited by ALD on this substrate material.
ER -
KRUMPOLEC, Richard, David Campbell CAMERON, Tomáš HOMOLA and Mirko ČERNÁK. Surface chemistry and initial growth of Al2O3 on plasma modified PTFE studied by ALD. \textit{Surfaces and Interfaces}. Amsterdam: Elsevier Science, 2017, vol.~6, March, p.~223-228. ISSN~2468-0230. Available from: https://dx.doi.org/10.1016/j.surfin.2016.10.005.
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