Surface chemistry and initial growth of Al2O3 on plasma
modified PTFE studied by ALD

J 2017

Surface chemistry and initial growth of Al2O3 on plasma modified PTFE studied by ALD

KRUMPOLEC, Richard, David Campbell CAMERON, Tomáš HOMOLA and Mirko ČERNÁK

Basic information

Original name

Surface chemistry and initial growth of Al2O3 on plasma modified PTFE studied by ALD

Authors

KRUMPOLEC, Richard (703 Slovakia, guarantor, belonging to the institution), David Campbell CAMERON (826 United Kingdom of Great Britain and Northern Ireland, belonging to the institution), Tomáš HOMOLA (703 Slovakia, belonging to the institution) and Mirko ČERNÁK (703 Slovakia, belonging to the institution)

Edition

Surfaces and Interfaces, Amsterdam, Elsevier Science, 2017, 2468-0230

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Netherlands

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

RIV identification code

RIV/00216224:14310/17:00095963

Organization unit

Faculty of Science

DOI

http://dx.doi.org/10.1016/j.surfin.2016.10.005

UT WoS

000408907800031

Keywords in English

Atomic layer deposition; Nucleation; Plasma pre-treatment; Diffuse coplanar surface barrier discharge; PTFE

Abstract

V originále

An atmospheric-pressure DCSBD plasma in ambient air was used to clean and activate PTFE surfaces before low-temperature atomic layer deposition of Al2O3. It emerged that the fastest nucleation, leading to complete Al2O3 films, took place on PTFE samples that had been treated by plasma that led to the highest concentration of oxygen-containing functional groups. This condition required that some carbon contamination remained on the surface. Complete removal of surface carbon contamination to leave a surface close to stoichiometric PTFE was not beneficial from a film nucleation point of view, due to its lack of active nucleation sites. The results show that DCSBD treatment of PTFE in ambient air is an effective method of controlling and enhancing the nucleation process of thin films deposited by ALD on this substrate material.

Links

LO1411, research and development project

Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)

Investor: Ministry of Education, Youth and Sports of the CR

Citovat

KRUMPOLEC, Richard, David Campbell CAMERON, Tomáš HOMOLA and Mirko ČERNÁK. Surface chemistry and initial growth of Al2O3 on plasma modified PTFE studied by ALD. Surfaces and Interfaces. Amsterdam: Elsevier Science, 2017, vol. 6, March, p. 223-228. ISSN 2468-0230. Available from: https://dx.doi.org/10.1016/j.surfin.2016.10.005.

@article{1364697,
   author = {Krumpolec, Richard and Cameron, David Campbell and Homola, Tomáš and Černák, Mirko},
   article_location = {Amsterdam},
   article_number = {March},
   doi = {http://dx.doi.org/10.1016/j.surfin.2016.10.005},
   keywords = {Atomic layer deposition; Nucleation; Plasma pre-treatment; Diffuse coplanar surface barrier discharge; PTFE},
   language = {eng},
   issn = {2468-0230},
   journal = {Surfaces and Interfaces},
   title = {Surface chemistry and initial growth of Al2O3 on plasma modified PTFE studied by ALD},
   url = {http://www.sciencedirect.com/science/article/pii/S2468023016300529},
   volume = {6},
   year = {2017}
}

TY  - JOUR
ID  - 1364697
AU  - Krumpolec, Richard - Cameron, David Campbell - Homola, Tomáš - Černák, Mirko
PY  - 2017
TI  - Surface chemistry and initial growth of Al2O3 on plasma modified PTFE studied by ALD
JF  - Surfaces and Interfaces
VL  - 6
IS  - March
SP  - 223-228
EP  - 223-228
PB  - Elsevier Science
SN  - 24680230
KW  - Atomic layer deposition
KW  - Nucleation
KW  - Plasma pre-treatment
KW  - Diffuse coplanar surface barrier discharge
KW  - PTFE
UR  - http://www.sciencedirect.com/science/article/pii/S2468023016300529
L2  - http://www.sciencedirect.com/science/article/pii/S2468023016300529
N2  - An atmospheric-pressure DCSBD plasma in ambient air was used to clean and activate PTFE surfaces before low-temperature atomic layer deposition of Al2O3. It emerged that the fastest nucleation, leading to complete Al2O3 films, took place on PTFE samples that had been treated by plasma that led to the highest concentration of oxygen-containing functional groups. This condition required that some carbon contamination remained on the surface. Complete removal of surface carbon contamination to leave a surface close to stoichiometric PTFE was not beneficial from a film nucleation point of view, due to its lack of active nucleation sites. The results show that DCSBD treatment of PTFE in ambient air is an effective method of controlling and enhancing the nucleation process of thin films deposited by ALD on this substrate material.
ER  -

KRUMPOLEC, Richard, David Campbell CAMERON, Tomáš HOMOLA and Mirko ČERNÁK. Surface chemistry and initial growth of Al2O3 on plasma modified PTFE studied by ALD. \textit{Surfaces and Interfaces}. Amsterdam: Elsevier Science, 2017, vol.~6, March, p.~223-228. ISSN~2468-0230. Available from: https://dx.doi.org/10.1016/j.surfin.2016.10.005.

Detailed Information on Publication Record