| HEGEMANN, Dirk, Miroslav MICHLÍČEK, Noemi E. BLANCHARD, Urs SCHUTZ, Dominik LOHMANN, Marianne VANDENBOSSCHE, Lenka ZAJÍČKOVÁ and Martin DRABIK. Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges. Plasma processes and polymers. Weinheim: Wiley-VCH, 2016, vol. 13, No 2, p. 279-286. ISSN 1612-8850. Available from: https://dx.doi.org/10.1002/ppap.201500078. |
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@article{1375027,
author = {Hegemann, Dirk and Michlíček, Miroslav and Blanchard, Noemi E. and Schutz, Urs and Lohmann, Dominik and Vandenbossche, Marianne and Zajíčková, Lenka and Drabik, Martin},
article_location = {Weinheim},
article_number = {2},
doi = {http://dx.doi.org/10.1002/ppap.201500078},
keywords = {plasma polymer; functional groups; ion bombardment; cross-linking; aging},
language = {eng},
issn = {1612-8850},
journal = {Plasma processes and polymers},
title = {Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges},
url = {http://onlinelibrary.wiley.com/doi/10.1002/ppap.201500078/abstract;jsessionid=786281515922DCBB841ACC7AB907CF9C.f04t01?systemMessage=Pay+per+view+article+purchase%28PPV%29+on+Wiley+Online+Library+will+be+unavailable+on+Saturday+11th+March+from+05%3A00-14%},
volume = {13},
year = {2016}
}
TY - JOUR
ID - 1375027
AU - Hegemann, Dirk - Michlíček, Miroslav - Blanchard, Noemi E. - Schutz, Urs - Lohmann, Dominik - Vandenbossche, Marianne - Zajíčková, Lenka - Drabik, Martin
PY - 2016
TI - Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges
JF - Plasma processes and polymers
VL - 13
IS - 2
SP - 279-286
EP - 279-286
PB - Wiley-VCH
SN - 16128850
KW - plasma polymer
KW - functional groups
KW - ion bombardment
KW - cross-linking
KW - aging
UR - http://onlinelibrary.wiley.com/doi/10.1002/ppap.201500078/abstract;jsessionid=786281515922DCBB841ACC7AB907CF9C.f04t01?systemMessage=Pay+per+view+article+purchase%28PPV%29+on+Wiley+Online+Library+will+be+unavailable+on+Saturday+11th+March+from+05%3A00-14%
L2 - http://onlinelibrary.wiley.com/doi/10.1002/ppap.201500078/abstract;jsessionid=786281515922DCBB841ACC7AB907CF9C.f04t01?systemMessage=Pay+per+view+article+purchase%28PPV%29+on+Wiley+Online+Library+will+be+unavailable+on+Saturday+11th+March+from+05%3A00-14%
N2 - The deposition of functional plasma polymers such as a-C:H:O films is mainly influenced by fragmentation of the parent molecules in the gas phase as well as by the energetic conditions during film growth at the surface. The influence of gas phase and surface processes on the a-C:H:O film properties was thus investigated in order to optimize cross-linking and functional group density. The control of both conditions enables permanent functional plasma polymer films deposited within different reactor geometries (capacitively coupled symmetric vs. asymmetric at driven electrode and at grounded electrode). Comparison and up-scaling of such plasma polymerization processes are facilitated by knowing the internal energy input into the plasma and into the growing film surface.
ER -
HEGEMANN, Dirk, Miroslav MICHLÍČEK, Noemi E. BLANCHARD, Urs SCHUTZ, Dominik LOHMANN, Marianne VANDENBOSSCHE, Lenka ZAJÍČKOVÁ and Martin DRABIK. Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges. \textit{Plasma processes and polymers}. Weinheim: Wiley-VCH, 2016, vol.~13, No~2, p.~279-286. ISSN~1612-8850. Available from: https://dx.doi.org/10.1002/ppap.201500078.
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