KLEIN, Peter, Jaroslav HNILICA, Zdeněk HUBIČKA, Martin ČADA, Marta ŠLAPANSKÁ, Miroslav ZEMÁNEK and Petr VAŠINA. Cathode voltage and discharge current oscillations in HiPIMS. Plasma Sources Science and Technology. Bristol: IOP Publishing LTD, vol. 26, No 5, p. nestránkováno, 12 pp. ISSN 0963-0252. doi:10.1088/1361-6595/aa62ee. 2017.
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Basic information
Original name Cathode voltage and discharge current oscillations in HiPIMS
Authors KLEIN, Peter (703 Slovakia, belonging to the institution), Jaroslav HNILICA (203 Czech Republic, belonging to the institution), Zdeněk HUBIČKA (203 Czech Republic), Martin ČADA (203 Czech Republic), Marta ŠLAPANSKÁ (203 Czech Republic, belonging to the institution), Miroslav ZEMÁNEK (203 Czech Republic, belonging to the institution) and Petr VAŠINA (203 Czech Republic, guarantor, belonging to the institution).
Edition Plasma Sources Science and Technology, Bristol, IOP Publishing LTD, 2017, 0963-0252.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 3.939
RIV identification code RIV/00216224:14310/17:00094725
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1088/1361-6595/aa62ee
UT WoS 000398394500002
Keywords in English HiPIMS; voltage and current oscillations; spokes
Tags NZ, rivok
Tags International impact, Reviewed
Changed by Changed by: Ing. Nicole Zrilić, učo 240776. Changed: 29/3/2018 23:21.
Abstract
This paper reports on the oscillations both on the cathode voltage and on the discharge current which emerged suddenly and simultaneously during a high-power impulse magnetron sputtering pulse. Detailed experiments identified the pressure and the discharge current ranges to detect these oscillations. The oscillations originated from the magnetized plasma and their frequency ranged from 225 kHz to 400 kHz depending on the experimental conditions. Simultaneous measurement of both oscillations and spokes was conducted to find mutual correlations. The oscillations always accompanied the spokes and no particular conditions to detect oscillations in the absence of spokes were found. The oscillations were not caused by the rotational motion of the spokes but emerged when a certain threshold amount of spokes was overreached.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
GA15-00863S, research and development projectName: Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace
Investor: Czech Science Foundation
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
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